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A compact model for III-V nanowire electrostatics including band non-parabolicity

机译:包含带非抛物线的III-V纳米线静电的紧凑模型

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摘要

The III-V materials have a highly non-parabolic band structure that significantly affects the MOS transistor electrostatics. The compact models used to simulate circuits involving III-V MOS transistors must account for this band structure nonparabolicity for accurate results. In this work, we propose a modification to the energy dispersion relation to include the band structure non-parabolicity in a way suitable for compact models. Unlike the available non-parabolic energy dispersion relation, the one proposed here is simple and includes the non-parabolicity in both confinement and transport directions. The proposed dispersion relation is then used to model the electrostatics of III-V nanowire transistors. The proposed model is scalable to a higher number of sub-bands and computationally efficient for circuit simulators. The model is also validated with the data from a 2D Poisson-Schrodinger solver for a wide range of nanowire dimensions, III-V channel materials, and found to be in excellent agreement with the simulation data.
机译:III-V材料具有高度非抛物线的能带结构,极大地影响了MOS晶体管的静电。用于模拟涉及III-V MOS晶体管的电路的紧凑型模型必须考虑该带结构的非抛物线性,以获得准确的结果。在这项工作中,我们提出了一种对能量色散关系的修改,以适合紧凑模型的方式包括了能带结构的非抛物线性。与可用的非抛物线能量色散关系不同,此处提出的关系很简单,并且在限制和传输方向上都包含非抛物线性。然后,将建议的色散关系用于模拟III-V纳米线晶体管的静电。所提出的模型可扩展到更多的子带,并且对于电路仿真器具有计算效率。该模型还使用来自二维Poisson-Schrodinger求解器的数据进行了验证,该数据适用于各种纳米线尺寸,III-V沟道材料,并且与仿真数据非常吻合。

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