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首页> 外文期刊>Journal of circuits, systems and computers >Kapees 3: A High-Quality VLSI Placement Tool Using Nesterov's Method for Density Penalty
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Kapees 3: A High-Quality VLSI Placement Tool Using Nesterov's Method for Density Penalty

机译:Kapees 3:使用Nesterov方法进行密度惩罚的高质量VLSI放置工具

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摘要

We present an analytical approach that is based on nonlinear programming to perform VLSI standard cell placement. Our method first clusters a netlist to reduce the number of cells and then performs quadratic optimization on the reduced netlist. Finally, it uses Nesterov's method for solving nonlinear equations for the problem. The framework of our tool, Kapees3, is scalable and generates high quality results. The experimental results for Peko Suite 1 and Peko Suite 2 benchmarks show promising improvements. Our placement tool outperforms NTUPlace3, Dragon, Feng Shui, Capo10.5, by 46%, 57%, 48% and 25%, respectively, on PEKO Suite 1. For PEKO Suite 2, our placement tool outperforms NTUPlace3, Dragon, Feng Shui, Capo10.5 and mPL6 by 30%, 47%, 57%, 69% and 2.7%, respectively. On MMS benchmarks, we obtain wirelength improvement over Capo10.5 by 56.62%, FLOP by 7.84%, FastPlace by 11.55%, Com PLx by 4.58%, POLAR by 23.67%, mPL6 by 9.96% and NTUPlace3-Unified by 2.96%.
机译:我们提出了一种基于非线性编程的分析方法来执行VLSI标准单元放置。我们的方法首先对网表进行聚类以减少像元数,然后对精简后的网表执行二次优化。最后,它使用Nesterov方法求解非线性方程组。我们的工具Kapees3的框架是可扩展的,并且可以产生高质量的结果。 Peko Suite 1和Peko Suite 2基准测试的实验结果显示出可喜的改进。在PEKO Suite 1上,我们的放置工具的性能分别比NTUPlace3,Dragon,风水和Capo10.5高出46%,57%,48%和25%。对于PEKO Suite 2,我们的放置工具的性能优于NTUPlace3,Dragon,风水。 ,Capo10.5和mPL6分别增加30%,47%,57%,69%和2.7%。在MMS基准上,与Capo10.5相比,我们的线长提高了56.62%,FLOP降低了7.84%,FastPlace降低了11.55%,Com PLx降低了4.58%,POLAR降低了23.67%,mPL6降低了9.96%,NTUPlace3-Unified降低了2.96%。

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