Effect of Collision Focusing on Monocrystalline Sputtering Yield Theory

摘要

An improvement is offered to the theoretical model of monocyrstalline sputtering yield proposed by Southern, Willis, and Robinson. The collision focusing effect, not considered in the original model, is included by multiplication of a momentum conductance factor which removes the dependence upon first collision depth and substitutes the effect of momentum propagation along the close‐packed directions from the point of the first collision to the crystal surface. The inclusion of this factor yields better agreement with the data.