Role of the Competing Etching Process in Determining the Quality of Pyrolytically Grown Silicon and Germanium Films

Bylander E. G.

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Role of the Competing Etching Process in Determining the Quality of Pyrolytically Grown Silicon and Germanium Films

机译：竞争蚀刻工艺在确定热解生长的硅和锗薄膜质量中的作用

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来源
《Journal of Applied Physics 》 |1964年第4期| 共2页
作者
Bylander E. G.;
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作者单位

U. S. Naval Ordnance Laboratory, White Oak, Silver Spring, Maryland;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
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2. Deposition of high quality amorphous silicon, germanium and silicon-germanium thin films by a hollow cathode reactive sputtering system [J] . Soukup RJ., Ianno NJ., Pribil G., Surface & Coatings Technology . 2004 ,第0期

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4. OPTICAL ABSORPTION IN SILICON GERMANIUM FILM GROWN ON SILICON SUBSTRATE [C] . Dun Li, Xin Zhao, Li Wang, European Photovoltaic Solar Energy Conference and Exhibition . 2014

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5. Investigation of light absorption and emission in germanium and germanium tin films grown on silicon substrates. [D] . Mathews, Jay. 2011

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6. Formation of silicon nanowire packed films from metallurgical-grade silicon powder using a two-step metal-assisted chemical etching method [O] . Rachid Ouertani, Abderrahmen Hamdi, Chohdi Amri, 2014

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Role of the Competing Etching Process in Determining the Quality of Pyrolytically Grown Silicon and Germanium Films

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