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Composition versus a0 and Tc relations in superconducting ’’Nb3Ge’’ thin films

机译:“ Nb3Ge”超导薄膜的成分与a0和Tc关系

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A large series of well‐crystallized ’’Nb3Ge’’ thin films have been prepared by carefully controlled rf sputtering. The compositions expressed as Nb/Ge ratios for these essentially single‐phase ’’Nb3Ge’’ thin films were determined by electron microprobe (EMP) analysis, ion scattering spectrometry, and wet chemistry (WC). Based on lattice‐parameter considerations, this series of films spanned the entire homogeneity range of ’’Nb3Ge’’ phases, from the metastable Ge‐rich end (a0≪5.167 Å) to the metastable Nb‐rich end (a0≳5.176 Å). The data from the different analytical methods and annealing experiments suggest that typical films are Ge enriched at the substrate interface and germanium and/or oxygen enriched for almost 600 Å from the exposed surface. Intercorrelations of increased reliability have now been established between Tc, the Nb/Ge ratio, and a0. An extrapolation of the EMP Nb/Ge ratio versus a0 and Tc data predict an a0 of 5.127 Å and a Tc of 23.4 °K for a phase of Nb3Ge stoichiometry. The correlation between the EMP Nb/Ge ratio and a0 obtained from a single‐phase bulk ’’Nb3Ge’’ sample was found to be in excellent agreement with the data obtained from the present study’s rf‐sputtered ’’Nb3Ge’’ thin films.
机译:通过精心控制的射频溅射已经制备了一系列结晶良好的“ Nb3Ge”薄膜。这些基本上单相的“ Nb3Ge”薄膜的成分以Nb / Ge比表示,是通过电子探针(EMP)分析,离子散射光谱法和湿化学法(WC)确定的。基于晶格参数的考虑,该系列薄膜涵盖了从“亚稳富锗”端(a0≪5.167Å)到亚稳富Nb富端(a0≳5.176Å)的整个“ Nb3Ge”相均匀性范围。 。来自不同分析方法和退火实验的数据表明,典型的薄膜在衬底界面处富集了锗,而锗和/或氧从裸露的表面富集了近600。现在已经在Tc,Nb / Ge比和a0之间建立了可靠性提高的相互关系。 EMP Nb / Ge比对a0和Tc数据的外推预测Nb3Ge化学计量相的a0为5.127Å,Tc为23.4°K。从单相块“ Nb3Ge”样品获得的EMP Nb / Ge比与a0之间的相关性与从本研究的射频溅射“ Nb3Ge”薄膜获得的数据高度吻合。

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    《Journal of Applied Physics》 |1976年第10期|P.4635-4642|共8页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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