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Ballistic and overshoot electron transport in bulk semiconductors and in submicronic devices

机译:大块半导体和亚微器件中的弹道和过冲电子传输

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The possibility of ballistic and overshoot transport in bulk semiconductor and submicronic devices are discussed using both simple analytical calculation and more exact Monte Carlo simulation. Assuming a homogeneous semiconductor, it appears possible, using a really ballistic motion of electrons to achieve over very short distances (a few tenths of a micron) higher velocities than in the overshoot motion. The influence of the doping concentration and of the operating temperature, as well as the improvement which could be achieved by using other materials, is also discussed. The potential of such ballistic motion and velocity overshoot in a real submicronic device is then assessed; it is shown that, due to spatial nonuniformities, additional phenomena occur which might considerably change, and often reduce, the velocity of the carriers.
机译:使用简单的分析计算和更精确的蒙特卡洛模拟,讨论了在体半导体和亚微器件中弹道和过冲传输的可能性。假设半导体是均匀的,使用电子的真正弹道运动来实现比超调运动更短的距离(十分之几微米)更高的速度似乎是可能的。还讨论了掺杂浓度和操作温度的影响,以及通过使用其他材料可以实现的改进。然后评估实际亚微米设备中这种弹道运动和速度超调的可能性;结果表明,由于空间的不均匀性,会出现其他现象,这些现象可能会大大改变并经常降低载体的速度。

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    《Journal of Applied Physics》 |1983年第1期|P.214-221|共8页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 入库时间 2022-08-17 13:16:55

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