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首页> 外文期刊>Journal of Applied Physics >Defect mechanisms in the In2O3(ZnO)k system (k = 3, 5, 7, 9)
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Defect mechanisms in the In2O3(ZnO)k system (k = 3, 5, 7, 9)

机译:In2O3(ZnO)k系统中的缺陷机理(k = 3、5、7、9)

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The defect chemistry of several compounds in the In2O3(ZnO)k series (k = 3, 5, 7, and 9) was investigated in bulk specimens by analysis of the dependence of their conductivity on the oxygen partial pressure. The resulting Brouwer slopes were inconsistent with a doubly charged oxygen vacancy defect model, and varied with the phase. The k = 3 phase had behavior similar to donor-doped In2O3, and the behavior of the other phases resembled that of donor-doped ZnO. The donor in both cases is proposed to be In occupying Zn sites. First principles calculations of the formation energy of intrinsic defects in this system support the proposed models. The present work expands prior theoretical analysis to include acceptor defects, such as cation vacancies (VZn, VIn) and oxygen interstitials (Oi).
机译:通过分析其电导率对氧分压的依赖性,研究了In2O3(ZnO)k系列(k = 3、5、7和9)中几种化合物的缺陷化学(k = 3、5、7和9)。最终的布劳维尔斜率与双电荷氧空位缺陷模型不一致,并且随相位而变化。 k = 3相的行为类似于掺杂施主的In2O3,其他相的行为类似于掺杂施主的ZnO。两种情况下的供体均被提议为占据锌位点。该系统中固有缺陷形成能的第一性原理计算支持所提出的模型。本工作扩展了先前的理论分析,以包括受体缺陷,例如阳离子空位(VZn,VIn)和氧间隙(Oi)。

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