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Improved multiferroic properties in Sm-doped BiFeO3 thin films deposited using chemical solution deposition method

机译:化学溶液沉积法改善掺m的BiFeO3薄膜的多铁性

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摘要

Sm-substituted (0% to 10%) BiFeO3 thin films were fabricated by chemical solution deposition on Pt/Ti/SiO2/Si substrates. X-ray diffraction analysis revealed that no secondary phase appeared even if Bi atoms were substituted with Sm atoms up to 10 at. %. 7.5 at. % Sm-substituted films show improved electrical properties and substitution was effective in improving the coercive field in the films. Sm-substitution shows improved ferroelectric as well as magnetic properties of the films. There is a noticeable reduction in the leakage current density (10-4 A/cm2) and increase in the polarization (70 μC/cm2) when the Sm concentration is kept around 7.5%. The magnetic moment obtained from the saturated magnetization curves shows a value of 0.3 μB/Fe compared to 0.04 μB/Fe for the parent compound. The results are important since it increases the potential of the material as a multiferroic compound.
机译:通过化学溶液沉积在Pt / Ti / SiO2 / Si衬底上制备了Sm取代(0%至10%)的BiFeO3薄膜。 X射线衍射分析表明,即使Bi原子被高达10at。的Sm原子取代,也没有二次相出现。 %。 7.5 at。 %Sm-取代的膜显示出改善的电性能,并且替代有效地改善了膜中的矫顽场。 Sm取代显示出改善的铁电性和薄膜的磁性。漏电流密度(10 -4 A / cm 2 )明显降低,极化强度增加(70μC/ cm 2 )当Sm浓度保持在7.5%附近时。从饱和磁化曲线获得的磁矩显示值为0.3μB/ Fe,而母体化合物为0.04μB/ Fe。结果很重要,因为它增加了材料作为多铁化合物的潜力。

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  • 来源
    《Journal of Applied Physics》 |2012年第10期|p.1-4|共4页
  • 作者

    Singh S. K.;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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