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首页> 外文期刊>Journal of Applied Physics >Guided photoluminescence study of Nd-doped silicon rich silicon oxide and silicon rich silicon nitride waveguides
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Guided photoluminescence study of Nd-doped silicon rich silicon oxide and silicon rich silicon nitride waveguides

机译:Nd掺杂富硅氧化硅和富硅氮化硅波导的引导光致发光研究

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摘要

Planar waveguides made of Nd3+-doped silicon rich silicon oxide (SRSO) and silicon rich silicon nitride (SRSN) have been fabricated by reactive magnetron sputtering and characterized with special emphasis on the comparison of the guided photoluminescence (PL) properties of these two matrices. Guided fluorescence excited by top surface pumping at 488 nm on planar waveguides was measured as a function of the distance between the excitation area and the output of the waveguide, as well as a function of the pump power density. The PL intensity increased linearly with pump power without any saturation even at high power. The linear intensity increase of the Nd3+ guided PL under a non-resonant excitation (488 nm) confirms the efficient coupling between either Si-np and rare-earth ions for SRSO or radiative defects and rare earth ions for SRSN. The guided fluorescences at 945 and 1100 nm were observed until 4 mm and 8 mm of the output of the waveguide for Nd3+ doped SRSO and SRSN waveguides, respectively. The guided fluorescence decays of Nd3+-doped-SRSO and -SRSN planar waveguides have been measured and found equal to 97 μs ±7 and 5 μs ± 2, respectively. These results show notably that the Nd3+-doped silicon rich silicon oxide is a very promising candidate on the way to achieve a laser cavity at 1.06 μm.
机译:通过反应磁控溅射制备了由Nd 3 + 掺杂的富硅氧化硅(SRSO)和富硅氮化硅(SRSN)制成的平面波导,其特征是特别强调了引导光致发光的比较这两个矩阵的(PL)属性。测量了在平面波导上以488 nm的顶表面泵浦激发的引导荧光,它是激发面积与波导输出之间的距离以及泵浦功率密度的函数。 PL强度随泵浦功率线性增加,即使在高功率下也不会出现饱和。 Nd 3 + 引导的PL在非共振激发(488 nm)下的线性强度增加证实了SRSO的Si-np和稀土离子或辐射缺陷和稀土之间的有效耦合SRSN用离子。在掺Nd 3 + 的SRSO和SRSN波导中,分别观察到在945和1100 nm处的引导荧光,直到波导的输出分别为4 mm和8 mm。测量了掺Nd 3 + 的SRSO和-SRSN平面波导的导引荧光衰减,发现分别等于97μs±7和5μs±2。这些结果显着地表明,Nd 3 +-掺杂的富硅氧化硅在实现1.06μm的激光腔的途中是非常有前途的候选者。

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