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首页> 外文期刊>Journal of Applied Physics >Study of deep hole trap levels associated with bias-induced metastabilities in Cu(In,Ga)Se2 thin films using isothermal capacitance transient spectroscopy
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Study of deep hole trap levels associated with bias-induced metastabilities in Cu(In,Ga)Se2 thin films using isothermal capacitance transient spectroscopy

机译:等温电容瞬态光谱法研究Cu(In,Ga)Se2薄膜中与偏压诱导的亚稳态有关的深孔陷阱能级

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The origins of bias-induced metastabilities in Cu(In,Ga)Se2 thin film samples were investigated using isothermal capacitance transient spectroscopy. We confirmed that these metastabilities are associated with deep hole trap levels, and examined these levels in detail. The trap has multiple charge states, tentatively assigned to a double acceptor, where the first (−1/0) acceptor level has an apparent activation energy of 0.72 eV and the second acceptor level (−2/−1) has an apparent activation energy of 0.51 eV, indicating negative-U-like properties. The metastable behavior becomes prominent on forward biasing of the junction, which was attributed to the slow hole-capture rate of the first (−1/0) acceptor level. This slow rate is probably because of a large lattice relaxation associated with the hole-capture process, as well as depletion of free holes because of the excess concentration of the deep level compared with the net concentration of shallow acceptors.
机译:使用等温电容瞬态光谱法研究了Cu(In,Ga)Se2薄膜样品中偏磁引起的亚稳态的起源。我们证实了这些亚稳态与深孔陷阱的水平有关,并详细检查了这些水平。陷阱具有多个电荷状态,暂定分配给双受主,其中第一(-1/0)受主能级的表观活化能为0.72 eV,第二受主水平(−2 / −1)的表观活化能为值为0.51 eV,表示类似U型的负性。在结的正向偏置时,亚稳态行为变得突出,这归因于第一(-1/0)受体水平的缓慢空穴捕获率。这种较慢的速率可能是由于与空穴捕获过程相关的大晶格弛豫,以及由于与浅受体的净浓度相比,深能级的过量浓度导致自由空穴的耗尽。

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    《Journal of Applied Physics 》 |2014年第5期| 1-6| 共6页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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