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The 2D Debye length: An analytical study of weak charge screening in 2D semiconductors

机译:2D debye长度:2D半导体中弱电荷筛选的分析研究

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摘要

Simple perturbations (such as a line charge or a sheet charge) in 2D semiconducting materials create difficult solutions to the Poisson equation due to the non-uniform out-of-plane electric fields that result from the perturbative charge. Here, for the first time, we determine simple and general analytical expressions for the potential profile, its Fourier representation, the corresponding 2D Debye screening length, and the charge screening behavior in 2D semiconductors due to a line charge perturbation. In contrast to conventional 3D semiconductors, we find that the 2D Debye length goes as 1/N_(D,2D), where N_(D,2D) is the 2D semiconductor doping density, and this leads to markedly different Debye lengths as compared to those determined by the conventional (3D) Debye length expression. We show that the potential profile due to a charge perturbation in a 2D semiconductor does not decay exponentially with distance from the perturbation (as is the case for 3D semiconductors) but instead decays logarithmically in the immediate vicinity of the perturbation and as 1/x~2 when the distance is approximately equal to or greater than the 2D Debye length. Overall, this work establishes an analytical approach for determining a fundamental electrostatic parameter for 2D semiconductors.
机译:2D半导体材料中的简单扰动(例如线电荷或纸张电荷)由于扰动电荷导致的不均匀平面电场而产生困难的泊松方程。在此,我们首次确定潜在的轮廓,其傅立叶表示,相应的2D脱墨筛选长度以及由于线电荷扰动的2D半导体中的电荷筛选行为的简单和一般的分析表达。与传统的3D半导体相比,我们发现2D de debye长度作为1 / n_(d,2d),其中n_(d,2d)是2d半导体掺杂密度,并且这导致与...相比显着不同的Debye长度。由常规(3D)Deybye表达决定的那些。我们表明,由于2D半导体中的电荷扰动导致的潜在型材不会逐渐衰减,距离扰动(如3d半导体的情况而言),而是在扰动附近衰减和为1 / x〜 2当距离大致等于或大于2D debye长度时。总的来说,这项工作建立了一种用于确定2D半导体基本静电参数的分析方法。

著录项

  • 来源
    《Journal of Applied Physics》 |2021年第2期|024301.1-024301.10|共10页
  • 作者单位

    Department of Electrical Engineering Columbia University New York New York 10027 USA Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology Cambridge Massachusetts USA;

    National Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies Tsukuba 305-8568 Japan;

    Department of Electrical Engineering Columbia University New York New York 10027 USA;

    Department of Electrical Engineering Columbia University New York New York 10027 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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