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Impact of UV-induced ozone and low-energy Ar~+-ion cleaning on the chemical structure of Cu(ln,Ga)(S,Se)_2 absorber surfaces

机译:UV诱导的臭氧和低能量Ar〜+ --ION清洁对Cu(LN,Ga)(S,Se)_2吸收剂表面的化学结构的影响

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摘要

Dry buffer layer deposition techniques for chalcopyrite (CIGSSe)-based thin-film solar cells lack the surface-cleaning characteristics of the commonly used CdS or Zn(0,S) wet-chemical bath deposition. A UV-induced ozone and/or a low-energy Ar~+-ion treatment could provide dry CIGSSe surface cleaning steps. To study the impact of these treatments, the chemical surface structure of a CIGSSe absorber is investigated. For this purpose, a set of surface-sensitive spectroscopic methods, i.e., laboratory-based x-ray photoelectron spectroscopy and x-ray-excited Auger electron spectroscopy, is combined with synchrotron-based soft x-ray emission spectroscopy. After treatment times as short as 15 s, the UV-induced ozone treatment decreases the amount of carbon adsorbates at the CIGSSe surface significantly, while the oxygen content increases. This is accompanied by the oxidation of all absorber surface elements, i.e., indium, selenium, sulfur, and copper. Short (60 s) low-energy Ar~+-ion treatments, in contrast, primarily remove oxygen from the surface. Longer treatment times also lead to a removal of carbon, while extremely long treatment times can also lead to additional (likely metallic) Cu phases at the absorber surface as well.
机译:基于氯化物(CIGSSE)的干燥缓冲层沉积技术(CIGSSE)基础薄膜太阳能电池缺乏常用的CDS或Zn(0,S)湿化学浴沉积的表面清洁特性。 UV诱导的臭氧和/或低能量Ar〜+ -Ion治疗可以提供干CIGSSE表面清洁步骤。为了研究这些处理的影响,研究了CIGSSE吸收剂的化学表面结构。为此目的,一组表面敏感的光谱方法,即基于实验室的X射线光电子能谱和X射线激发螺旋电子光谱,与基于同步的软X射线发射光谱相结合。处理时间短至15秒后,UV诱导的臭氧处理显着降低了CIGSSE表面的碳吸附量,而氧含量增加。这伴随着所有吸收剂表面元素的氧化,即铟,硒,硫和铜。相比之下,短(60秒)低能量Ar〜+温度治疗主要从表面上除去氧气。较长的治疗时间也导致除去碳,而极长的治疗时间也可以导致吸收体表面上的另外(可能的金属)Cu相。

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  • 来源
    《Journal of Applied Physics》 |2020年第15期|155301.1-155301.7|共7页
  • 作者单位

    Institute for Photon Science and Synchrotron Radiation (IPS) Karlsruhe Institute of Technology (KIT) Hermann-v.-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany Institute for Chemical Technology and Polymer Chemistry (ITCP) Karlsruhe Institute of Technology (KIT) Engesserstrasse 18/20 76131 Karlsruhe Germany;

    Institute for Photon Science and Synchrotron Radiation (IPS) Karlsruhe Institute of Technology (KIT) Hermann-v.-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany Institute for Chemical Technology and Polymer Chemistry (ITCP) Karlsruhe Institute of Technology (KIT) Engesserstrasse 18/20 76131 Karlsruhe Germany Department of Chemistry and Biochemistry University of Nevada Las Vegas (UNLV) 4505 Maryland Parkway Las Vegas Nevada 89154-4003 USA;

    AVANCIS GmbH Otto-Hahn-Ring 6 81739 Munchen Germany;

    AVANCIS GmbH Otto-Hahn-Ring 6 81739 Munchen Germany;

    AVANCIS GmbH Otto-Hahn-Ring 6 81739 Munchen Germany;

    AVANCIS GmbH Otto-Hahn-Ring 6 81739 Munchen Germany;

    Advanced Light Source Lawrence Berkeley National Laboratory 1 Cyclotron Road Berkeley California 94720 USA Chemical Sciences Division Lawrence Berkeley National Laboratory 1 Cyclotron Road Berkeley California 94720 USA;

    Advanced Light Source Lawrence Berkeley National Laboratory 1 Cyclotron Road Berkeley California 94720 USA;

    Institute for Photon Science and Synchrotron Radiation (IPS) Karlsruhe Institute of Technology (KIT) Hermann-v.-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany Institute for Chemical Technology and Polymer Chemistry (ITCP) Karlsruhe Institute of Technology (KIT) Engesserstrasse 18/20 76131 Karlsruhe Germany Department of Chemistry and Biochemistry University of Nevada Las Vegas (UNLV) 4505 Maryland Parkway Las Vegas Nevada 89154-4003 USA;

    Institute for Photon Science and Synchrotron Radiation (IPS) Karlsruhe Institute of Technology (KIT) Hermann-v.-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany Institute for Chemical Technology and Polymer Chemistry (ITCP) Karlsruhe Institute of Technology (KIT) Engesserstrasse 18/20 76131 Karlsruhe Germany Department of Chemistry and Biochemistry University of Nevada Las Vegas (UNLV) 4505 Maryland Parkway Las Vegas Nevada 89154-4003 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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