首页> 外文期刊>Journal of Applied Physics >Current driven chiral domain wall motions in synthetic antiferromagnets with Co/Rh/Co
【24h】

Current driven chiral domain wall motions in synthetic antiferromagnets with Co/Rh/Co

机译:具有CO / RH / CO的合成反铁磁体中的电流驱动手性域壁运动

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Spin-orbit torque that originates from spin Hall effect and Dzyaloshinskii-Moriya interaction (DMI) can efficiently move chiral magnetic domain walls in perpendicularly magnetized wires. It has been shown that antiferromagnetically coupled composite domain walls across a ruthenium layer can be driven even faster by exchange coupling torque that is proportional to exchange coupling strength. Here, we report a current-driven motion of composite chiral domain walls in synthetic antiferromagnets with a rhodium spacer layer. It is found that the domain walls in the wire with a rhodium layer do not move as fast as that with a ruthenium layer although the exchange coupling in Co|Rh|Co is stronger than Co|Ru|Co, which is due to the formation of a large DMI at the Rh|Co interface. The Dzyaloshinskii-Moriya interaction at the Co/Rh interface has the same sign and comparable strength to the Pt|Co interface, thus negating the exchange coupling torque. The spin Hall effect from rhodium is found to be as small as ruthenium. Our findings show that rhodium can be used to tailor the DMI strengths in the current-driven motion of chiral domain walls in various magnetic nanostructures.
机译:旋转轨道扭矩源自旋转霍尔效应和Dzyaloshinskii-Moriya相互作用(DMI)可以有效地在垂直磁化的电线中移动手性磁畴壁。已经证明,通过与交换耦合强度成比例的交换耦合扭矩,可以更快地驱动横跨钌层的反铁磁性耦合的复合畴壁。在这里,我们在具有铑间隔层的合成反铁磁体中报告了复合手性畴壁的电流驱动运动。发现具有铑层的电线中的畴壁不会像钌层一样快地移动,尽管CO | RU的交换耦合比CO |更强,因此是由于形成RH | CO接口的大DMI。 CO / RH接口的Dzyaloshinskii-Moriya相互作用具有与PT | CO接口相同的符号和相当的强度,从而否定交换耦合扭矩。发现铑的旋转霍尔效应被发现与钌一样小。我们的研究结果表明,铑可用于在各种磁性纳米结构中定制手性域壁的电流驱动运动中的DMI强度。

著录项

  • 来源
    《Journal of Applied Physics》 |2020年第5期|053902.1-053902.5|共5页
  • 作者单位

    IBM Research-Almaden San Jose California 95120 USA The Pritzker School of Molecular Engineering University of Chicago Chicago Illinois 60637 USA;

    IBM Research-Almaden San Jose California 95120 USA Ecole superieure de physique et de chimie industrielles de la Ville de Paris Paris 75005 France;

    IBM Research-Almaden San Jose California 95120 USA Department of Electrical and Electronic Engineering Ecole Polytechnique Federale de Lausanne 1015 Lausanne Switzerland;

    IBM Research-Almaden San Jose California 95120 USA;

    IBM Research-Almaden San Jose California 95120 USA;

    IBM Research-Almaden San Jose California 95120 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号