首页> 外文期刊>Journal of Applied Physics >Effect of hole blocking layer on V-pit hole injection and internal quantum efficiency in GaN-based yellow LED
【24h】

Effect of hole blocking layer on V-pit hole injection and internal quantum efficiency in GaN-based yellow LED

机译:孔阻断层对GaN基黄光LED V型坑洞注射和内量子效应的影响

获取原文
获取原文并翻译 | 示例
           

摘要

Five types of GaN-based yellow light-emitting diodes (LEDs) with both a V-pit and a hole blocking layer (HBL) have been investigated numerically. The simulation results show that the GaN hole blocking layer in the p region (HBLP) can not only increase the ratio of the hole current via the V-pit, but also increase the electron leakage into the p layer via the flat region, leading to the lower internal quantum efficiency (IQE). Compared to the GaN HBLP, the Al_(0.5)Ga_(0.5)N HBLP is helpful in suppressing the electron leakage via the flat region to the p layer; however, it increases the electron leakage via the V-pits to the p layer, resulting in an unsatisfactory improvement of IQE. In order to settle out this issue, the AlN hole blocking layer in the n region (HBLN) is designed in the sidewall of the V-pit. It is found that the HBLN can not only alleviate the electron leakage via the V-pits to the p layer, more importantly, but also block the hole leakage via the V-pits to the n layer, leading to the improvement of IQE.
机译:已经在数值上研究了具有V坑和空穴阻挡层(HBL)的五种类型的GaN基黄光二极管(LED)。仿真结果表明,P区(HBLP)中的GaN空穴阻挡层不仅可以通过V形凹坑增加孔电流的比率,而且还通过平坦区域增加电子泄漏到P层中,导致较低的内部量子效率(IQE)。与GaN HBLP相比,AL_(0.5)GA_(0.5)N HBLP有助于通过平坦区域抑制到P层的电子泄漏;然而,它通过对P层的V-Pits增加了电子泄漏,从而不令人满意的IQE改善。为了解决这个问题,N区(HBLN)中的ALN空穴阻挡层设计在V-坑的侧壁中。结果发现,HBLN不仅可以通过V-Pits对P层减轻电子泄漏,还可以更重要的是,还可以通过对N层的V-Pits阻挡孔泄漏,从而导致IQE的改善。

著录项

  • 来源
    《Journal of Applied Physics》 |2020年第18期|185704.1-185704.8|共8页
  • 作者单位

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

    National Institute of LED on Si Substrate Nanchang University Nanchang 330047 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号