...
首页> 外文期刊>Journal of Applied Physics >Exciton-polaritons of a 2D semiconductor layer in a cylindrical microcavity
【24h】

Exciton-polaritons of a 2D semiconductor layer in a cylindrical microcavity

机译:圆柱形微腔中的2D半导体层的激子 - 极性恒星

获取原文
获取原文并翻译 | 示例

摘要

We describe exciton-polariton modes formed by the interaction between excitons in a 2D layer of a transition metal dichalcogenide embedded in a cylindrical microcavity and the microcavity photons. For this, an expression for the excitonic susceptibility of a semiconductor disk placed in the symmetry plane perpendicular to the axis of the microcavity is derived. Semiclassical theory provides dispersion relations for the polariton modes, while the quantum-mechanical treatment of a simplified model yields the Hopfield coefficients, measuring the degree of exciton-photon mixing in the coupled modes. The density of states (DOS) and its projection onto the photonic and the excitonic subspaces are calculated, taking monolayer MoS_2 embedded in a Si3_N_4 cylinder as an example. The calculated results demonstrate a strong enhancement for certain frequencies of the total and local DOS (and, consequently, of the spontaneous emission rate of a nearby point emitter, i.e., the Purcell effect) caused by the presence of the 2D layer.
机译:我们描述了通过嵌入圆柱形微腔和微腔光子的2D型过渡金属二甲基化物的2D层中的激子之间的相互作用形成的Exciton-Polariton模式。为此,得出了垂直于微腔轴的对称平面中放置在对称平面中的半导体盘的激动敏感性的表达。半经典理论为极化型模式提供了分散关系,而简化模型的量子机械处理产生了Hopfield系数,测量耦合模式中的激子光子混合程度。计算状态(DOS)的密度及其投影在光子和激发子空间上,以嵌入Si3_N_4圆柱体的单层MOS_2为例。计算结果表明,对于通过2D层的存在引起的总和和局部DOS的某些频率(以及所附点发射器的自发发射率,即嘌呤效应的自发发射率)的频率强大。

著录项

  • 来源
    《Journal of Applied Physics 》 |2020年第13期| 133101.1-133101.14| 共14页
  • 作者单位

    Centro de Fisica Universidade do Minho Campus de Gualtar Braga 4710-057 Portugal;

    Facultad de Fisica Universidad de La Habana Vedado 10400 La Habana Cuba CLAF-Centro Latino-Americano de Fisica Avenida Venceslau Braz 71 Fundos 22290-140 Rio de Janeiro Brazil;

    Centro de Fisica Universidade do Minho Campus de Gualtar Braga 4710-057 Portugal International Iberian Nanotechnology Laboratory Av. Mestre Jose Veiga s Braga 4715-330 Portugal;

    Centro de Fisica Universidade do Minho Campus de Gualtar Braga 4710-057 Portugal International Iberian Nanotechnology Laboratory Av. Mestre Jose Veiga s Braga 4715-330 Portugal;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号