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首页> 外文期刊>Journal of Applied Physics >Direct observations of crystallization processes of amorphous GeSn during thermal annealing: A temperature window for suppressing Sn segregation
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Direct observations of crystallization processes of amorphous GeSn during thermal annealing: A temperature window for suppressing Sn segregation

机译:热退火过程中无定形GESN结晶过程的直接观察:抑制Sn偏析的温度窗口

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摘要

The solubility limit of tin (Sn) in germanium (Ge) is very small, and, therefore, it is difficult to synthesize high Sn concentration GeSn crystals by conventional methods. An amorphous phase can contain elements beyond the solubility limit of the crystal state, and, therefore, recrystallization of the amorphous alloy is one of the possible ways to realize materials far from the equilibrium state. To suppress Sn precipitation during thermal annealing, knowledge of crystallization processes is required. In the present study, amorphous GeSn thin films with different Sn concentrations were prepared by sputtering, and their crystallization processes were examined by in situ transmission electron microscopy. It was found that the crystallization temperature decreases with increasing Sn concentration, and it became lower than the eutectic temperature when the Sn concentration exceeded similar to 25 at.%. Radial distribution function analyses revealed that phase decomposition occurs in the amorphous state of the specimens which crystallize below the eutectic temperature, and Sn crystallites were simultaneously precipitated with crystallization. On the other hand, no remarkable phase decomposition was detected in amorphous GeSn with 25 at.% Sn. Sn precipitation occurred at a higher temperature than the crystallization in these specimens, and the difference between the crystallization and Sn precipitation temperatures became large with decreasing Sn concentration. Because of the existence of this temperature difference, a temperature window for suppressing Sn segregation existed. We demonstrated that large GeSn grains with high Sn concentration could be realized by annealing the specimens within the temperature window. Published under license by AIP Publishing.
机译:锗(Ge)中锡(Sn)的溶解度极限非常小,因此,难以通过常规方法合成高Sn浓度Gesn晶体。非晶相可以含有超出晶体状态的溶解度极限的元件,因此,无定形合金的重结晶是实现远离均衡状态的材料的可能方法之一。为了在热退火过程中抑制Sn降水,需要了解结晶过程。在本研究中,通过溅射制备具有不同Sn浓度的非晶Gesn薄膜,通过原位透射电子显微镜检查它们的结晶过程。发现结晶温度随着Sn浓度的增加而降低,当Sn浓度超过25时,它变得低于共晶温度。%。径向分布函数分析显示,相位分解在结晶低于共晶温度下结晶的标本的无定形状态,并用结晶同时沉淀SN微晶。另一方面,在具有<25at的无定形GES中没有检测到显着的相分解。%Sn。 Sn沉淀发生在比这些样本中的结晶更高的温度下,并且结晶和Sn沉淀温度之间的差异随着SN浓度而变大。由于这种温差的存在,存在用于抑制Sn偏析的温度窗口。我们证明,通过在温度窗口内的标本退火,可以实现具有高Sn浓度的大型GESN晶粒。通过AIP发布在许可证下发布。

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  • 来源
    《Journal of Applied Physics 》 |2019年第17期| 175703.1-175703.8| 共8页
  • 作者单位

    Kyushu Inst Technol Dept Mat Sci & Engn Kitakyushu Fukuoka 8048550 Japan;

    Kyushu Inst Technol Dept Mat Sci & Engn Kitakyushu Fukuoka 8048550 Japan;

    Osaka Prefecture Univ Dept Mat Sci Sakai Osaka 5998531 Japan;

    Osaka Prefecture Univ Dept Mat Sci Sakai Osaka 5998531 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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