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Quadratic electromechanical strain in silicon investigated by scanning probe microscopy

机译:通过扫描探针显微镜研究硅中的二次机电应变

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摘要

Piezoresponse force microscopy (PFM) is a powerful tool widely used to characterize piezoelectricity and ferroelectricity at the nanoscale. However, it is necessary to distinguish microscopic mechanisms between piezoelectricity and non-piezoelectric contributions measured by PFM. In this work, we systematically investigate the first and second harmonic apparent piezo-responses of a silicon wafer in both vertical and lateral modes, and we show that it exhibits an apparent electromechanical response that is quadratic to the applied electric field, possibly arising from ionic electrochemical dipoles induced by the charged probe. As a result, the electromechanical response measured is dominated by the second harmonic response in the vertical mode, and its polarity can be switched by the DC voltage with the evolving coercive field and maximum amplitude, in sharp contrast to typical ferroelectric materials we used as control. The ionic activity in silicon is also confirmed by the scanning thermo-ionic microscopy measurement, and the work points toward a set of methods to distinguish true piezoelectricity from the apparent ones. Published by AIP Publishing.
机译:压电响应力显微镜(PFM)是一种强大的工具,广泛用于在纳米级上表征压电和铁电性。然而,有必要区分压电和通过PFM测量的非压电贡献之间的显微机制。在这项工作中,我们系统地研究了垂直和横向模式中硅晶片的第一和第二谐波表观压电响应,并且我们表明它表现出一种表观的机电响应,其对所施加的电场具有二次,可能由离子产生电化学探针引起的电化学偶极子。结果,测量的机电响应由垂直模式中的第二次谐波响应主导,并且其极性可以通过DC电压与演变的矫顽磁场和最大幅度切换,与我们用作控制的典型铁电材料鲜明对比。硅中的离子活性也通过扫描热离子显微镜测量来证实,并且工作点朝向一组方法来区分真正的压电从表观物质。通过AIP发布发布。

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  • 来源
    《Journal of Applied Physics》 |2018年第15期|155104.1-155104.6|共6页
  • 作者单位

    Xiangtan Univ Minist Educ Key Lab Low Dimens Mat & Applicat Technol Xiangtan 411105 Hunan Peoples R China;

    Univ Washington Dept Mech Engn Seattle WA 98195 USA;

    Xiangtan Univ Minist Educ Key Lab Low Dimens Mat & Applicat Technol Xiangtan 411105 Hunan Peoples R China;

    Xiangtan Univ Minist Educ Key Lab Low Dimens Mat & Applicat Technol Xiangtan 411105 Hunan Peoples R China;

    Chinese Acad Sci Shenzhen Inst Adv Technol Shenzhen Key Lab Nanobiomech Shenzhen 518055 Guangdong Peoples R China;

    Xiangtan Univ Minist Educ Key Lab Low Dimens Mat & Applicat Technol Xiangtan 411105 Hunan Peoples R China;

    Chinese Acad Sci Shenzhen Inst Adv Technol Shenzhen Key Lab Nanobiomech Shenzhen 518055 Guangdong Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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