Quantum well action model for the formation of a single Shockley stacking fault in a 4H-SiC crystal under non-equilibrium conditions

摘要

The formation of single Shockley stacking faults (SSSFs) in 4H-SiC crystals under non-equilibrium conditions (e.g., the forward biasing of PiN diodes and ultraviolet light illumination) is a key phenomenon in the so-called bipolar degradation of SiC power devices. This study theoretically investigated the physical mechanism of this phenomenon based on the concept of quantum well action. As a first approximation describing the non-equilibrium state of the material, we employed quasi-Fermi level approximation. We then made improvements by considering several physical effects governing the carrier distribution near and in the SSSF. The improved model accounts well for the excitation threshold and the temperature dependence of SSSF expansion. Thus, the model provides useful insights into the driving force of SSSF expansion under non-equilibrium conditions. Published under license by AIP Publishing.