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Improved thermal stability in doped MnN/CoFe exchange bias systems

机译:掺杂的MnN / CoFe交换偏置系统中改善的热稳定性

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摘要

We have investigated the influence of doping the antiferromagnetic MnN component in the polycrystalline MnN/CoFe exchange bias system, which shows high exchange bias of up to 1800 Oe at room temperature. The thermal stability of this system is limited by nitrogen diffusion that occurs during annealing. In order to predict improved thermal stability, defect energies of potential dopant elements which substitute for Mn were calculated via density functional theory. Elements calculated to have negative defect energies will bind nitrogen more strongly to the lattice, limiting diffusion. We prepared exchange bias stacks with dopant concentrations of a few percent by (reactive) co-sputtering, testing dopant elements with defect energies ranging from highly negative to slightly positive. We show that doping with elements calculated to have negative defect energies indeed improves the thermal stability. Y-doped MnN layers with dopant concentrations below 2% result in exchange bias fields higher than 1000 Oe for annealing temperatures up to 485 degrees C. Published by AIP Publishing.
机译:我们已经研究了在多晶MnN / CoFe交换偏压系统中掺杂反铁磁MnN组分的影响,该体系在室温下显示出高达1800 Oe的高交换偏压。该系统的热稳定性受到退火过程中发生的氮扩散的限制。为了预测改善的热稳定性,通过密度泛函理论计算了替代Mn的潜在掺杂元素的缺陷能。计算得出的具有负缺陷能的元素会将氮更牢固地结合到晶格上,从而限制了扩散。我们通过(反应性)共溅射制备了掺杂浓度为百分之几的交换偏置堆栈,测试了缺陷能量从高负到轻度正的掺杂元素。我们表明,掺杂计算为具有负缺陷能量的元素确实可以改善热稳定性。掺杂剂浓度低于2%的Y掺杂MnN层在高达485摄氏度的退火温度下会产生高于1000 Oe的交换偏置场。由AIP Publishing发布。

著录项

  • 来源
    《Journal of Applied Physics》 |2018年第20期|203902.1-203902.4|共4页
  • 作者

    Dunz M.; Bueker B.; Meinert M.;

  • 作者单位

    Bielefeld Univ, Dept Phys, Ctr Spinelect Mat & Devices, D-33501 Bielefeld, Germany;

    Bielefeld Univ, Dept Phys, Ctr Spinelect Mat & Devices, D-33501 Bielefeld, Germany;

    Bielefeld Univ, Dept Phys, Ctr Spinelect Mat & Devices, D-33501 Bielefeld, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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