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首页> 外文期刊>Journal of Applied Physics >Field sweep rate dependence of domain-wall speed distributions in a thin Ni_(80)Fe_(20) film
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Field sweep rate dependence of domain-wall speed distributions in a thin Ni_(80)Fe_(20) film

机译:Ni_(80)Fe_(20)薄膜中畴壁速度分布的场扫描速率依赖性

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摘要

The magnetization reversal in a thin (100 nm) Ni_(80)Fe_(20)/GaAs(001) film prepared by molecular-beam epitaxy has been investigated using a focused spot Kerr magnetometer. The field was sinusoidal and applied along an in-plane easy axis, with sweep rate at the coercive point in the range ~1 kOe/s-1 MOe/s. Real time measurements of the Kerr response enabled a study of the probability distributions P(V) of the domain-wall speed as a function of sweep rate. The shape of P(V) changes from being characteristic of stochastic domain-wall motion at low sweep rate to being characteristic of quasicontinuous domain-wall motion at high sweep rate. Increasing the diameter of the focused spot from 2 to 80 μm increases the number of domain walls participating in the reversal within the probed area, which leads to an averaging effect and dulls the transition from stochastic to quasicontinuous wall motion seen in the probability distributions.
机译:已经使用聚焦点克尔磁力计研究了通过分子束外延制备的(100 nm)Ni_(80)Fe_(20)/ GaAs(001)薄膜中的磁化反转。该磁场为正弦波,并沿面内易轴方向施加,矫顽点的扫描速率在〜1 kOe / s-1 MOe / s范围内。 Kerr响应的实时测量使得能够研究域壁速度随扫描速率变化的概率分布P(V)。 P(V)的形状从低扫描速率的随机畴壁运动特征变为高扫描速率的准连续畴壁运动特征。将聚焦点的直径从2μm增加到80μm,会增加参与探测区域内反转的畴壁的数量,这会导致平均效果,并且使概率分布中从随机运动到准连续壁运动的过渡变钝。

著录项

  • 来源
    《Journal of Applied Physics 》 |2004年第11期| p.6546-6549| 共4页
  • 作者单位

    Cavendish Laboratory, University of Cambridge, Cambridge, CB3 0HE, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学 ;
  • 关键词

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