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首页> 外文期刊>Journal of Applied Physics >Characterization of BaTi_(1-x)Zr_(x)O_(3) thin films obtained by a soft chemical spin-coating technique
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Characterization of BaTi_(1-x)Zr_(x)O_(3) thin films obtained by a soft chemical spin-coating technique

机译:通过软化学旋涂技术获得的BaTi_(1-x)Zr_(x)O_(3)薄膜的表征

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摘要

Single-phase perovskite structure BaZr_(x)Ti_(1-x)O_(3) (BZT) (0.05≤x≤0.25) thin films were deposited on Pt-Ti-SiO_(2)-Si substrates by the spin-coating technique. The structural modifications in the thin films were studied using x-ray diffraction and micro-Raman scattering techniques. Lattice parameters calculated from x-ray data indicate an increase in lattice (a axis) with the increasing content of zirconium in these films. Such Zr substitution also result in variations of the phonon mode wave numbers, especially those of lower wave numbers, for BaZr_(x)Ti_(1-x)O_(3) thin films, corroborate to the structural change caused by the zirconium doping. On the other hand, Raman modes persist above structural phase transition, although all optical modes should be Raman inactive in the cubic phase. The origin of these modes must be interpreted as a function of a local breakdown of the cubic symmetry, which could be a result of some kind of disorder. The BZT thin films exhibited a satisfactory dielectric constant close to 181-138, and low dielectric loss tan δ<0.03 at the frequency of 1 kHz. The leakage current density of the BZT thin films was studied at elevated temperatures and the data obey the Schottky emission model. Through this analysis the Schottky barrier height values 0.68, 1.39, and 1.24 eV were estimated to the BZT5, BZT15, and BZT25 thin films, respectively.
机译:通过旋涂在Pt-Ti-SiO_(2)-Si衬底上沉积单相钙钛矿结构BaZr_(x)Ti_(1-x)O_(3)(BZT)(0.05≤x≤0.25)薄膜技术。使用X射线衍射和显微拉曼散射技术研究了薄膜中的结构修饰。根据X射线数据计算出的晶格参数表明,随着这些薄膜中锆含量的增加,晶格(轴)也会增加。对于BaZr_(x)Ti_(1-x)O_(3)薄膜,这种Zr置换还导致声子模波数的变化,尤其是较低波数的声子波数的变化,这证实了由锆掺杂引起的结构变化。另一方面,拉曼模式在结构相变之上仍然存在,尽管所有光学模式在立方相中都应该是拉曼无效的。必须将这些模式的起源解释为立方对称性局部破坏的函数,这可能是某种无序的结果。 BZT薄膜在1 kHz的频率下具有接近181-138的令人满意的介电常数,介电损耗tanδ<0.03。在高温下研究了BZT薄膜的漏电流密度,数据服从肖特基发射模型。通过此分析,分别针对BZT5,BZT15和BZT25薄膜估计了肖特基势垒高度值0.68、1.39和1.24 eV。

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