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Optical emission from silicon-based SiO2 islands fabricated by anodic alumina templates

机译:阳极氧化铝模板制造的硅基SiO2岛的光发射

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摘要

We have investigated the photoluminescence spectra of silicon-based nanoscale SiO2 islands obtained by anodization of silicon-based aluminum membranes in a 0.3m sulfuric acid solution under a constant voltage of 25 V. Two ultraviolet emission bands were observed at 290 and 370 nm. After annealing the samples in 900degreesC in O-2, the 290 nm band vanishes, but the 370 nm band still exists. We suggest that the 290 nm band originates from optical transition in the E-' centers in the SiO2 islands according to its annealing behavior. The 370 nm band is considered to be from Al-related luminescence centers, [AlO4](0), because a decrease of intensity of the 370 nm band is in agreement with that of amount of the Al ion impurities located in the SiO2 islands. This work shows a clear understanding of the light-emitting mechanism of silicon-based SiO2 island array. The obtained result can be expected to have important applications in modem optoelectronics. (C) 2004 American Institute of Physics.
机译:我们已经研究了硅基纳米级SiO2岛的光致发光光谱,该岛由硅基铝膜在0.3m硫酸溶液中在25 V恒定电压下进行阳极氧化而获得。在290和370 nm处观察到两个紫外发射带。在O-2中在900摄氏度下对样品进行退火后,290 nm谱带消失了,但是370 nm谱带仍然存在。我们建议290 nm的光带根据其退火行为源自SiO2岛的E-'中心的光学跃迁。 370 nm的谱带被认为是与Al有关的发光中心[AlO4](0),因为370 nm谱带的强度降低与位于SiO2岛中的Al离子杂质的数量一致。这项工作清楚地了解了硅基SiO2岛阵列的发光机理。预期所获得的结果将在现代光电中具有重要的应用。 (C)2004美国物理研究所。

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