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首页> 外文期刊>Journal of Applied Physics >Physics-based simulation of buffer-trapping effects on slow current transients and current collapse in GaN field effect transistors
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Physics-based simulation of buffer-trapping effects on slow current transients and current collapse in GaN field effect transistors

机译:基于物理的GaN场效应晶体管中缓冲捕获对慢电流瞬变和电流崩溃的影响的仿真

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Two-dimensional transient analyses of GaN metal-semiconductor field effect transistors (MESFETs) are performed in which a three level compensation model is adopted for a semi-insulating buffer layer, where a shallow donor, a deep donor, and a deep acceptor are included. Quasipulsed current-voltage (Ⅰ-Ⅴ) curves are derived from the transient characteristics and are compared with steady-state Ⅰ-Ⅴ curves. It is shown that when the drain voltage V_D is raised abruptly, the drain current I_D overshoots the steady-state value, and when V_D is lowered abruptly, I_D remains at a low value for some periods, showing drain-lag behavior. These are explained by the deep donor's electron capturing and electron emission processes quantitatively. The drain lag could be a major cause of current collapse, although some gate lag is also seen due to the buffer layer. The current collapse is shown to be more pronounced when the deep-acceptor density in the buffer layer is higher and when an off-state drain voltage is higher, because the change of ionized deep-donor density becomes larger and hence the trapping effects become more significant. It is suggested that to minimize the current collapse in GaN-based FETs, an acceptor density in a semi-insulating layer should be made low, although the current cutoff behavior may be degraded.
机译:对GaN金属半导体场效应晶体管(MESFET)进行了二维瞬态分析,其中对半绝缘缓冲层采用了三级补偿模型,其中包括浅施主,深施主和深受主。根据瞬态特性得出准脉冲电流-电压(Ⅰ-Ⅴ)曲线,并将其与稳态Ⅰ-Ⅴ曲线进行比较。结果表明,当漏极电压V_D突然升高时,漏极电流I_D会超过稳态值,而当V_D突然降低时,I_D会在一段时间内保持较低值,这表明漏极滞后行为。这些由深度施主的电子俘获和电子发射过程定量地解释。漏极滞后可能是电流崩溃的主要原因,尽管由于缓冲层也可能会出现一些栅极滞后。当缓冲层中的深受体密度较高和截止态漏极电压较高时,电流崩塌会更明显,这是因为电离的深施主密度的变化变大,因此俘获效应变得更大。重大。建议使GaN基FET中的电流崩溃最小化,尽管电流截止行为可能会降低,但应降低半绝缘层中的受主密度。

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