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Magnetic properties of amorphous iron nitride films by ion-beam sputtering

机译:离子束溅射非晶态氮化铁膜的磁性

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摘要

Amorphous films of magnetic iron nitride have been prepared by reactive ion-beam sputtering. The amorphous microstructure is expected to have several advantages over the crystalline films in terms of high-frequency applications. Films of two different compositions have been prepared by varying the partial pressure of N_2. The structural and magnetic properties of the films have been studied using x-ray scattering, Moessbauer spectroscopy, and magneto-optic Kerr-effect measurements. The films are found to transform into a mixture of nanocrystalline ε-Fe_3N and α-Fe phases in the temperature range 473-523 K. Moessbauer measurements in the nanocrystalline specimens give the composition of the two samples as Fe_(0.83)N_(0.17) and Fe_(0.87)N_(0.13) and saturation magnetization as 176 and 191 emu/g, respectively. The films exhibit excellent surface smoothness, which may be attributed to their amorphous microstructure. The as-deposited films exhibit corecivity of about 54 Oe, which increases upon nanocrystallization. The observed behavior of the coercivity can be understood in terms of a random-anisotropy model taking into account the reduced dimensionality of the system.
机译:磁性氮化铁的非晶膜已通过反应性离子束溅射制备。就高频应用而言,预期非晶态微结构具有优于结晶膜的多个优点。通过改变N_2的分压已经制备了两种不同组成的膜。使用X射线散射,Moessbauer光谱和磁光Kerr效应测量研究了薄膜的结构和磁性。发现薄膜在473-523 K的温度范围内转变为纳米晶ε-Fe_3N和α-Fe相的混合物。纳米晶样品中的Moessbauer测量得出两个样品的成分为Fe_(0.83)N_(0.17) Fe_(0.87)N_(0.13)和饱和磁化强度分别为176和191 emu / g。该膜表现出优异的表面光滑度,这可以归因于它们的无定形微观结构。所沉积的膜表现出约54 Oe的核心比,其随着纳米晶化而增加。考虑到系统尺寸降低,可以根据随机各向异性模型来理解所观察到的矫顽力行为。

著录项

  • 来源
    《Journal of Applied Physics》 |2005年第8期|p.083903.1-083903.6|共6页
  • 作者

    Ranu Dubey; Ajay Gupta;

  • 作者单位

    University Grants Commission (UGC)-Department of Atomic Energy (DAE) Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

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