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Postgrowth annealing effects on heteroepitaxial MnAs thin films grown on GaAs(001) and Si(001)

机译:生长后退火对在GaAs(001)和Si(001)上生长的异质外延MnAs薄膜的影响

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We have carried out postgrowth annealing studies on heteroepitaxial MnAs thin films deposited on GaAs(001) and Si(001) by molecular-beam epitaxy. Before annealing, a paramagnetic behavior is exhibited for MnAs/Si(001), whereas a ferromagnetic behavior is observed for MnAs/GaAs(001). The paramagnetic β-MnAs phase domains of the as-grown MnAs/GaAs(001) sample disappear completely after postgrowth annealing. Surprisingly, after postgrowth annealing, the crystal orientation of the MnAs/Si(001) film changes, and is accompanied by a shift from paramagnetic to ferromagnetic behavior. We attribute these observations to relaxation of the biaxial strain associated with the substrates.
机译:我们已经对通过分子束外延沉积在GaAs(001)和Si(001)上的异质外延MnAs薄膜进行了生长后退火研究。在退火之前,MnAs / Si(001)表现出顺磁行为,而MnAs / GaAs(001)表现出铁磁行为。生长后的MnAs / GaAs(001)样品的顺磁性β-MnAs相域在后生长退火后完全消失。出人意料的是,在后生长退火后,MnAs / Si(001)膜的晶体取向发生变化,并伴随着从顺磁行为向铁磁行为的转变。我们将这些观察结果归因于与基底相关的双轴应变的松弛。

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