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Optical and structural study of GaN nanowires grown by catalyst-free molecular beam epitaxy. Ⅱ. Sub-band-gap luminescence and electron irradiation effects

机译:通过无催化剂分子束外延生长的GaN纳米线的光学和结构研究。 Ⅱ。亚带隙发光和电子辐照效应

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GaN nanowires with diameters of 50-250 nm, grown by catalyst-free molecular beam epitaxy, were characterized by photoluminescence (PL) and cathodoluminescence (CL) spectroscopy at temperatures from 3 to 297 K. Both as-grown samples and dispersions of the nanowires onto other substrates were examined. The properties of the near-band-edge PL and CL spectra were discussed in Part I of this study by [Robins et al. [L. H. Robins, K. A. Bertness, J. M. Barker, N. A. Sanford, and J. B. Schlager, J. Appl. Phys. 101, 113505 (2007)]. Spectral features below the band gap, and the effect of extended electron irradiation on the CL, are discussed in Part Ⅱ. The observed sub-band-gap PL and CL peaks are identified as phonon replicas of the free-exciton transitions, or excitons bound to structural defects or surface states. The defect-related peaks in the nanowires are correlated with luminescence lines previously reported in GaN films, denoted the Y lines [M. A. Reshchikov and H. Morkoc, J. Appl. Phys. 97, 061301 (2005)]. The CL was partially quenched by electron beam irradiation for an extended time; the quenching was stronger for the free and shallow-donor-bound exciton peaks than for the defect-related peaks. The quenching appeared to saturate at high irradiation dose (with final intensity ≈30% of initial intensity) and was reversible on thermal cycling to room temperature. The electron irradiation-induced quenching of the CL is ascribed to charge injection and trapping phenomena.
机译:通过无催化剂分子束外延生长的直径为50-250 nm的GaN纳米线,其特征是在3至297 K的温度下通过光致发光(PL)和阴极发光(CL)光谱进行表征。检查在其他基板上。 [Robins等人在本研究的第一部分中讨论了近带边缘PL和CL光谱的特性。 [L. H.Robins,K.A.Bertness,J.M.Barker,N.A.Sanford和J.B.Schlager,J.Appl。物理101,113505(2007)]。在第二部分讨论了带隙以下的光谱特征,以及扩展的电子辐照对CL的影响。观察到的子带隙PL和CL峰被识别为自由激子跃迁的声子复制品,或与结构缺陷或表面状态结合的激子。纳米线中与缺陷有关的峰与先前在GaN膜中报道的发光线相关,称为Y线[M. A. Reshchikov和H. Morkoc,J。Appl。物理97,061301(2005)]。通过电子束辐照将CL部分淬灭一段较长的时间。自由和浅供体结合的激子峰的淬灭作用比缺陷相关峰的淬灭作用强。淬灭似乎在高辐照剂量下达到饱和(最终强度约为初始强度的30%),并且在热循环至室温时是可逆的。电子辐射引起的CL的猝灭归因于电荷注入和俘获现象。

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