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Piezoelectric Actuation Of (gan/)aigan/gan Heterostructures

机译:(gan /)aigan / gan异质结构的压电致动

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摘要

A detailed analysis of the piezoelectric response of (GaN/)AlGaN/GaN heterostructures is reported. The electromechanical properties of two types of heterostructures with an Al content of 31% are compared. Only a single two-dimensional electron gas (2DEG) is formed for samples with thin GaN cap layers, while both a 2DEG and a two-dimensional hole gas coexist in the case of thick GaN caps. The lower GaN layer represents the mechanically supporting layer, while the AlGaN film, and in some cases an additional GaN cap layer, serves as the piezoelectrically active layers for actuation. The 2DEG (at the lower AlGaN/GaN interface) provides the conducting channel which was used as back electrode for the applied external voltage. Electroreflectance spectroscopy is applied in order to determine the electric field distribution across the whole structure as a function of the applied voltage. It is found that only a part of the modulation voltage drops across the active region. Piezoelectric force microscopy yields the field (voltage)-dependent actuation of the layers. By correlating the results of the two experimental techniques we are able to determine the piezoelectric modulus d_(33) with considerably improved reliability. A value for Al_(0.31)Ga_(0.69)N of 5 pm/V is found which is higher than an estimation based on previously reported data for GaN and AlN.
机译:报告了对(GaN /)AlGaN / GaN异质结构的压电响应的详细分析。比较了两种Al含量为31%的异质结构的机电性能。对于具有薄GaN盖层的样品,仅形成一个二维电子气(2DEG),而在厚GaN盖的情况下,2DEG和二维空穴气并存。下部GaN层代表机械支撑层,而AlGaN膜(在某些情况下还包括一个额外的GaN盖层)充当用于驱动的​​压电活性层。 2DEG(在下部AlGaN / GaN界面处)提供了导电通道,该通道用作施加外部电压的背面电极。施加电反射光谱法是为了确定整个结构上的电场分布与施加电压的关系。发现只有一部分调制电压在有源区上下降。压电显微镜可产生与电场(电压)有关的层。通过关联两种实验技术的结果,我们能够确定压电模量d_(33),且可靠性大大提高。发现Al_(0.31)Ga_(0.69)N的值为5 pm / V,该值高于基于先前报告的GaN和AlN数据的估计值。

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