Hofe Trap Related Hysteresis In Pentacene Field-effect Transistors

摘要

We have investigated hysteresis in pentacene-based field-effect transistors with SiO_2 as gate dielectric. A clear hysteresis behavior in transfer and output characteristics is reported. Measurements show that the observed hysteresis is due to hole trapping in the pentacene film. Long time constants of the trapping/detrapping mechanism are demonstrated through transient measurements. An initialization routine to be performed prior to measurements is proposed to enable reproducible and reliable measurements on pentacene transistors.