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首页> 外文期刊>Journal of Applied Physics >Direct observation of domain wall structures in curved permalloy wires containing an antinotch
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Direct observation of domain wall structures in curved permalloy wires containing an antinotch

机译:直接观察包含抗缺口的弯曲坡莫合金丝中的畴壁结构

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摘要

The formation and field response of head-to-head domain walls in curved permalloy wires, fabricated to contain a single antinotch, have been investigated using Lorentz microscopy. High spatial resolution maps of the vector induction distribution in domain walls close to the antinotch have been derived and compared with micromagnetic simulations. In wires of 10 nm thickness the walls are typically of a modified asymmetric transverse wall type. Their response to applied fields tangential to the wire at the antinotch location was studied. The way the wall structure changes depends on whether the field moves the wall away from or further into the notch. Higher fields are needed and much more distorted wall structures are observed in the latter case, indicating that the antinotch acts as an energy barrier for the domain wall.
机译:使用洛伦兹显微镜研究了弯曲的坡莫合金丝中头对头畴壁的形成和场响应,这些弯曲的坡莫合金线被制造为包含单个抗缺口。推导了接近反缺口的畴壁中矢量感应分布的高空间分辨率图,并将其与微磁模拟进行了比较。在厚度为10 nm的导线中,壁通常为改良的不对称横向壁类型。研究了它们对在反缺口位置与导线相切的外加电场的响应。墙壁结构的变化方式取决于电场是将墙壁移开还是移出凹口。在后一种情况下,需要更高的磁场,并且观察到的壁结构也要扭曲得多,这表明抗缺口作用是畴壁的能量屏障。

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