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Effects of stoichiometry on defect formation in ZnO epilayers grown by molecular-beam epitaxy: An optically detected magnetic resonance study

机译:化学计量对分子束外延生长的ZnO外延层中缺陷形成的影响:光学检测的磁共振研究

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摘要

Photoluminescence (PL) and optically detected magnetic resonance are employed to study effects of nonstoichiometry during the growth on defect formation in ZnO epilayers grown by molecular-beam epitaxy (MBE). Several defects are revealed via monitoring the yellow PL emission (~2.17 eV) and their magnetic resonance signatures are obtained. The defects are concluded to be common for the MBE growth and are facilitated during the off-stoichiometric growth conditions, especially under excess of oxygen.
机译:利用光致发光(PL)和光学检测的磁共振来研究生长期间非化学计量对分子束外延(MBE)所生长的ZnO外延层中缺陷形成的影响。通过监测黄色PL发射(〜2.17 eV)可以发现一些缺陷,并获得其磁共振特征。这些缺陷被认为是MBE生长中常见的缺陷,并且在化学计量以外的生长条件下尤其是在氧气过量的情况下容易发生。

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