Nonlinear refraction properties of nickel oxide thin films at 800 nm

摘要

Measurements of the nonlinear refractive index, n_2, of nickel oxide films prepared by controlled oxidation of nickel films deposited on substrates of soda-lime glass are reported. The structure and morphology of the samples were characterized by scanning electron microscopy, atomic force microscopy, and x-ray diffractometry. Samples of excellent optical quality were prepared. The nonlinear measurements were performed using the thermally managed eclipse Z-scan technique at 800 nm. A large value of n_2≈10~(-12) cm~2/W and negligible nonlinear absorption were obtained.