Annealing Of Cofeb/mgo Based Single And Double Barrier Magnetic Tunnel Junctions: Tunnel Magnetoresistance, Bias Dependence, And Output Voltage

摘要

Co_(40)Fe_(40)B_(20)/MgO single and double barrier magnetic tunnel junctions (MTJs) were grown using target-facing-target sputtering for MgO barriers and conventional dc magnetron sputtering for Co_(40)Fe_(40)B_(20) ferromagnetic electrodes. Large tunnel magnetoresistance (TMR) ratios, 230% for single barrier MTJs and 120% for the double barrier MTJs, were obtained after postdeposition annealing in a field of 800 mT. The lower TMR ratio for double barrier MTJs can be attributed to the amorphous nature of the middle Co_(40)Fe_(40)B_(20) free layer, which could not be crystallized during postannealing. A highly asymmetric bias voltage dependence of the TMR can be observed for both single and double barrier MTJs in the as-deposited states and after field annealing at low temperature. The asymmetry decreases with increasing annealing temperature and the bias dependence becomes almost symmetric after annealing at 350 ℃. Maximum output voltages of 0.65 and 0.85 V were obtained for both single and double barrier MTJs, respectively, after annealing at 300 ℃, a temperature which is high enough for large TMR ratios but insufficient to completely remove asymmetry from the TMR bias dependence.