Electrical resistivity of nanocrystalline Al-doped zinc oxide films as a function of Al content and the degree of its segregation at the grain boundaries

摘要

Highly transparent and conducting Al-doped ZnO (AZO) films are prepared via sol-gel method with a broad range of nominal Al-doping. The film porosity and morphology is determined by the rate of temperature ramping during the drying of the gel phase. The minimum resistivity is observed to occur around 1.5-2 at. % Al-doped films, irrespective of the morphology and microstructure. It is found by local chemical analysis that Al tends to segregate at the grain boundaries and above a critical concentration, the segregated Al starts to dominate the electronic transport in nanocrystalline AZO. The optical measurements corroborate these findings showing a systematic increase in carrier density only up to 1.5-2 at. % Al-doping. It is concluded that the presence of the resistivity minimum is not merely determined by a solubility limit but is a result of the interplay between the changing carrier concentration and carrier scattering at the segregated Al.