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首页> 外文期刊>Journal of Applied Physics >Improved hole confinement in GaInAsN-GaAsSbN thin double-layer quantum-well structure for telecom-wavelength lasers
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Improved hole confinement in GaInAsN-GaAsSbN thin double-layer quantum-well structure for telecom-wavelength lasers

机译:用于电信波长激光器的GaInAsN-GaAsSbN薄双层量子阱结构中的孔限制得到改善

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摘要

In this work we demonstrated increased hole confinement in a bilayer quantum well that consists of two thin layers of GaInAsN/GaAsSbN confined by GaAs barriers. Comparison between the temperature dependence of photoluminescence intensity of the bilayer and GaInAsN quantum wells indicated that electrons rather than holes are the less confined carriers in the bilayer structure. This structure enables independent control of the band gap energy, band offsets and reduces the temperature sensitivity of laser performance. The calculations showed that a bilayer based short-period superlattice would provide a high optical gain at 1.3-1.55 μm due to increased electron-hole wave functions overlap.
机译:在这项工作中,我们证明了在双层量子阱中增加的空穴限制,该双层量子阱由GaAs势垒限制的两层GaInAsN / GaAsSbN薄层组成。双层和GaInAsN量子阱的光致发光强度的温度依赖性之间的比较表明,在双层结构中,电子而不是空穴是受约束较小的载流子。这种结构可以独立控制带隙能量,带偏移并降低激光器性能的温度敏感性。计算表明,基于双层的短周期超晶格将由于增加的电子-空穴波函数重叠而在1.3-1.55μm处提供较高的光学增益。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第9期|p.093116.1-093116.6|共6页
  • 作者

    Asaf Albo; Gad Bahir; Dan Fekete;

  • 作者单位

    Department of Electrical Engineering, Technion-Israel Institute of Technology, Haifa 32000, Israel;

    Department of Electrical Engineering, Technion-Israel Institute of Technology, Haifa 32000, Israel;

    Department of Physics, Technion-Israel Institute of Technology, Haifa 32000, Israel;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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