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首页> 外文期刊>Journal of Applied Physics >The effects of Schottky barrier profile on spin dependent tunneling in a ferromagnet-insulator-semiconductor system
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The effects of Schottky barrier profile on spin dependent tunneling in a ferromagnet-insulator-semiconductor system

机译:肖特基势垒分布对铁磁-绝缘体-半导体系统中自旋隧穿的影响

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摘要

The insertion of a tunnel barrier between a ferromagnetic (FM) metal source lead and a semiconductor (SC) layer has proved effective in achieving high spin injection efficiency at the FM-SC interface. We investigate the spin transport across a FM-I (insulator)-SC interface, under the influence of a Schottky barrier which arises in the SC layer close to the interface. The spin transport in the presence of an applied voltage is calculated via the nonequilibrium Green's function (NEGF) tight binding model. The NEGF formalism systematically accounts for: (i) the spatial profile of the Schottky barrier, (ii) the coupling between the FM lead and the SC layer, and (iii) the effect of the entire semi-infinite lead, which can be reduced to a self-energy term. We investigate several parameters (e.g., doping concentration, built-in potential and applied bias) which affect the Schottky barrier profile, and hence the spin current across the FM/I/SC system. It is shown that the spin polarization of current can be significantly improved by having a low Schottky barrier height, but a high built-in potential. A high doping density increases the current density by decreasing the Schottky barrier height and the depletion width, but at the cost of reduced spin polarization.
机译:事实证明,在铁磁(FM)金属源极引线和半导体(SC)层之间插入隧道势垒可有效实现FM-SC接口处的高自旋注入效率。我们在肖特基势垒的影响下研究了穿过FM-I(绝缘子)-SC接口的自旋传输,该肖特基势垒出现在靠近接口的SC层中。通过非平衡格林函数(NEGF)紧密结合模型计算存在施加电压时的自旋输运。 NEGF形式主义系统地解释了:(i)肖特基势垒的空间分布,(ii)FM引线和SC层之间的耦合,以及(iii)整个半无限引线的影响,可以减小自能量的术语。我们研究了影响肖特基势垒分布的几个参数(例如掺杂浓度,内置电势和施加的偏置),从而影响了FM / I / SC系统的自旋电流。结果表明,具有低肖特基势垒高度但具有高内置电势可以显着改善电流的自旋极化。高掺杂密度通过降低肖特基势垒高度和耗尽层宽度来增加电流密度,但以降低自旋极化为代价。

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  • 来源
    《Journal of Applied Physics 》 |2010年第3期| P.034503.1-034503.7| 共7页
  • 作者单位

    Department of Electrical and Computer Engineering, Information Storage Materials Laboratory, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 Data Storage Institute, A~*STAR (Agency for Science, Technology and Research), DSI Building, 5 Engineering Drive 1, Singapore 117608;

    Department of Electrical and Computer Engineering, Information Storage Materials Laboratory, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 Department of Electrical and Computer Engineering, Computational Nanoelectronics and Nano-device Laboratory, National University of Singapore, 4 Engineering Drive 3, Singapore 117576;

    Data Storage Institute, A~*STAR (Agency for Science, Technology and Research), DSI Building, 5 Engineering Drive 1, Singapore 117608 Department of Electrical and Computer Engineering, Computational Nanoelectronics and Nano-device Laboratory, National University of Singapore, 4 Engineering Drive 3, Singapore 117576;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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