机译:InGaN层和在(0001)GaN上生长的阱中主要是位错的起源
School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;
School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;
School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;
School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;
Soitec Phoenix Labs, Tempe, Arizona 85284-1808, USA;
Soitec Phoenix Labs, Tempe, Arizona 85284-1808, USA;
Department of Chemical Engineering and Materials Science, University of California, Davis, California 95616, USA;
机译:在具有ZrB_2(0001)缓冲层的Si(111)衬底上生长的InGaN / GaN多量子阱发光二极管
机译:富含缺陷的GaN中间层,有助于消除在(0001)取向的蓝宝石衬底上生长的极性GaN晶体中的位错
机译:降低在无台阶(0001)4H-SiC台面表面上生长的均匀GaN层中的位错密度
机译:通过无掩膜外延外延生长的GaN(0001)层中X射线微衍射表征应力松弛,位错和晶体学倾斜
机译:以极性,半极性和非极性方向生长的InGaN / GaN多量子阱发光二极管。
机译:应变松弛对在具有溅射AlN成核层的4英寸蓝宝石衬底上生长的InGaN / GaN绿色LED的性能的影响
机译:富含缺陷的GaN中间层,促进在(0001)的蓝宝石底板上生长的极性GaN晶体中的螺纹脱位湮灭