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Origin of predominantly a type dislocations in InGaN layers and wells grown on (0001) GaN

机译:InGaN层和在(0001)GaN上生长的阱中主要是位错的起源

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摘要

Threading dislocations that are of a type were observed to form locally in InGaN layers and wells containing 7%-15% indium. Direct correlations between a type dislocations and stacking faults in InGaN layers and wells were observed. The formation of these dislocations is attributed to the dissociation of Shockley partials bounding the stacking faults.
机译:观察到一种类型的螺纹位错在InGaN层和包含7%-15%铟的阱中局部形成。观察到InGaN层和阱中的类型位错与堆叠缺陷之间的直接相关性。这些位错的形成归因于肖克利局部的解离限制了层状断层。

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  • 来源
    《Journal of Applied Physics》 |2011年第7期|p.073503.1-073503.6|共6页
  • 作者单位

    School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;

    School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;

    School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;

    School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe,Arizona 85287-6106, USA;

    Soitec Phoenix Labs, Tempe, Arizona 85284-1808, USA;

    Soitec Phoenix Labs, Tempe, Arizona 85284-1808, USA;

    Department of Chemical Engineering and Materials Science, University of California, Davis, California 95616, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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