首页> 外文期刊>Journal of Applied Physics >Effect of deposition parameters and semi-empirical relations between non-linear refractive index with linear refractive index and third order susceptibility for a-Ge_20Se_70-xln_10Bi_x thin films
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Effect of deposition parameters and semi-empirical relations between non-linear refractive index with linear refractive index and third order susceptibility for a-Ge_20Se_70-xln_10Bi_x thin films

机译:a-Ge_20Se_70-xln_10Bi_x薄膜的沉积参数和非线性折射率与线性折射率和三阶磁化率之间的关系

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摘要

Present work reports the influence of deposition parameters, i.e., the effect of the type of substrate on the optical properties of a-Ge_(20)Se_(70-x)In_(10)Bi_x (x = 0, 2, 4, 6, 8, and 10) thin films. Optical constants were accurately determined by envelope method using transmission spectra in the wavelength region of 400-1800 nm. The order obtained for the refractive index is n_(mica) > n_(microscope glass) > n(quartz) for different substrates used in the deposition of thin films. The bandgap of the film deposited on mica substrate is smallest as compared to the bandgap of the films deposited on microscopic glass and quartz. To open the possibility of the use of chalcogenide glasses for nonlinear switching, these vitreous systems were studied with respect to their non-linear susceptibility and refractive index. Third-order optical susceptibility (x~3) is evaluated from changes of index of refraction using Wang approximations. We examined the dependence of susceptibility on the absorption edge, thereby showing that the susceptibility rapidly increases with the redshift in absorption edge. Different formulations were used to predict the non-linear behavior of the Ge-Se-In-Bi system. The linear refractive index and Wemple-DiDomenico parameters were used for the determination of nonlinear refractive index in the wavelength region of 400 to 1800nm. The addition of Bi drastically increases the non-linear refractive index. In amorphous materials, maximum optical non-linearity has been predicted at a telecommunication wavelength (~1550nm). Comparison of our results shows a good agreement with values available in the literature at 0.8 eV or 1550 nm. Non-linear refractive indices, three orders higher than silica glass, were obtained in the system under investigation. The obtained results may lead to yield more sensitive optical limiting devices, and these glasses may be used as an optical material for a high speed communication fiber.
机译:目前的工作报道了沉积参数的影响,即衬底类型对a-Ge_(20)Se_(70-x)In_(10)Bi_x(x = 0,2,4,6 ,8和10)薄膜。通过使用400-1800nm波长范围内的透射光谱的包络线法准确测定光学常数。对于在薄膜沉积中使用的不同衬底,获得的折射率的顺序为n_(云母)> n_(显微镜玻璃)> n(石英)。与沉积在显微玻璃和石英上的薄膜的带隙相比,沉积在云母基底上的薄膜的带隙最小。为了打开使用硫族化物玻璃进行非线性转换的可能性,对这些玻璃体系统的非线性磁化率和折射率进行了研究。使用Wang近似法根据折射率的变化评估三阶光学磁化率(x〜3)。我们检查了磁化率对吸收边缘的依赖性,从而显示出磁化率随着吸收边缘的红移而迅速增加。使用不同的公式来预测Ge-Se-In-Bi系统的非线性行为。线性折射率和Wemple-DiDomenico参数用于确定400至1800nm波长区域的非线性折射率。 Bi的添加极大地增加了非线性折射率。在无定形材料中,已经预测了在电信波长(〜1550nm)下的最大光学非线性。我们的结果比较表明,与文献中在0.8 eV或1550 nm处可获得的值有很好的一致性。在所研究的系统中,获得了比石英玻璃高三倍的非线性折射率。所获得的结果可以导致产生更灵敏的光学限制装置,并且这些眼镜可以用作高速通信光纤的光学材料。

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  • 来源
    《Journal of Applied Physics》 |2011年第4期|p.043108.1-043108.7|共7页
  • 作者单位

    Department of Physics, AIAS, Amity University, Noida, India;

    Department of Physics, Panjab University, Chandigarh, India;

    Department of Physics, Jaypee University of Information Technology, Waknaghat, Solan, H.P, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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