...
首页> 外文期刊>Journal of Applied Physics >Inter layer exchange coupling in GaN-based diluted magnetic semiconductor multilayers studied by first-principles calculations
【24h】

Inter layer exchange coupling in GaN-based diluted magnetic semiconductor multilayers studied by first-principles calculations

机译:通过第一性原理计算研究GaN基稀磁半导体多层中的层间交换耦合

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Interlayer exchange coupling (IEC) in a series model diluted magnetic semiconductor (DMS) multilayer consisting of two magnetic (Ga, M)N (M = Mn or Cu) layers separated by non-doped or Mg-doped GaN non-magnetic spacers has been studied by first-principles calculations. The effects of the spacer thickness and of the hole doping to the IEC were studied systematically. It is observed that (1) without Mg doping, the IEC between two magnetic (Ga, M)N (M = Mn or Cu) layers is always ferromagnetic, which is clarified as an intrinsic character of the Ruderman-Kittle-Kasuya-Yoshida interaction in a two dimensional gaped system; (2) with Mg doping into the GaN spacer, the IEC is tunable from ferromagnetic to antiferromagnetic by varying the spacer's thickness and the dopant's site. It is found that the significant hybridization between the Cu and Mg dopants contributes considerable density of states around the Fermi energy level and thus enhances the magnetic interaction between the Cu-doped magnetic layers, indicating that Cu is a better dopant for device application of the GaN-based DMS multilayers.
机译:串联模型稀磁半导体(DMS)多层中的层间交换耦合(IEC),该多层由两层磁性(Ga,M)N(M = Mn或Cu)层组成,这些层由未掺杂或掺杂Mg的GaN非磁性隔离层隔开通过第一性原理计算进行了研究。系统研究了隔离层厚度和空穴掺杂对IEC的影响。可以观察到(1)没有掺杂Mg,两个磁性(Ga,M)N(M = Mn或Cu)层之间的IEC始终是铁磁性的,这被澄清为Ruderman-Kittle-Kasuya-Yoshida的固有特征在二维带隙系统中的相互作用; (2)通过将Mg掺杂到GaN隔离层中,可以通过更改隔离层的厚度和掺杂剂的位置将IEC从铁磁调整为反铁磁。发现Cu和Mg掺杂剂之间的显着杂化有助于在费米能级附近形成相当大的状态密度,从而增强了Cu掺杂磁性层之间的磁相互作用,这表明Cu对于GaN的器件应用而言是更好的掺杂剂。基于DMS的多层。

著录项

  • 来源
    《Journal of Applied Physics》 |2011年第12期|p.512-516|共5页
  • 作者单位

    Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China;

    Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China;

    Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China;

    Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号