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Low dark current metal-semiconductor-metal ultraviolet photodetectors based on sol-gel-derived TiO_2 films

机译:基于溶胶凝胶的TiO_2薄膜的低暗电流金属-半导体-金属紫外光电探测器

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摘要

The titanium dioxide (TiO_2) films prepared by sol-gel processing were used to fabricate metal-semiconductor-metal ultraviolet photodetectors. A very low dark current of 5.38 pA (current density of 3.84 nA/cm2) at 5 V bias is obtained, which is ascribed to the high effective Schottky barrier between Au and TiO_2 films. The x-ray photoelectron spectroscopy analysis demonstrates that the concentration of oxygen vacancies is very low in the surface of the TiO_2 films, which is responsible for the high effective Schottky barrier. The devices exhibit a cutoff wavelength at about 380 nm and a large UV-to-visible rejection ratio (340 versus 400 nm) of three orders of magnitude. The peak responsivity of the devices is 17.5 AAV at 5 V bias, indicating the presence of internal photoconductive gain induced by desorption of oxygen on the TiO_2 surface.
机译:通过溶胶-凝胶法制备的二氧化钛(TiO_2)薄膜被用于制造金属-半导体-金属紫外光电探测器。在5 V偏压下获得了非常低的5.38 pA暗电流(电流密度3.84 nA / cm2),这归因于Au和TiO_2薄膜之间的高效肖特基势垒。 X射线光电子能谱分析表明,TiO_2薄膜表面的氧空位浓度非常低,这是有效的肖特基势垒的原因。该器件在约380 nm处具有截止波长,并且具有3个数量级的大UV可见拒光比(340对400 nm)。器件在5 V偏压下的峰值响应率为17.5 AAV,表明存在由TiO_2表面上的氧气解吸引起的内部光电导增益。

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  • 来源
    《Journal of Applied Physics》 |2011年第2期|p.023114.1-023114.4|共4页
  • 作者单位

    Department of Physics, Xiamen University, Xiamen 361005, Fujian, People's Republic of China,Pen-Tung Sah Micro/Nano Technology Research Center, Xiamen University, Xiamen 361005, Fujian,People's Republic of China;

    Department of Physics, Xiamen University, Xiamen 361005, Fujian, People's Republic of China,Pen-Tung Sah Micro/Nano Technology Research Center, Xiamen University, Xiamen 361005, Fujian,People's Republic of China;

    Department of Materials Science and Engineering, National University of Singapore, Singapore 117576;

    Department of Physics, Xiamen University, Xiamen 361005, Fujian, People's Republic of China,Fujian Key Laboratory of Semiconductor Materials and Applications, Xiamen University,Xiamen 361005, Fujian, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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