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首页> 外文期刊>Journal of Applied Physics >Investigation of deep-level defects in conductive polymer on n-type 4H- and 6H-silicon carbide substrates using Ⅰ-ⅤI and deep level transient spectroscopy techniques
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Investigation of deep-level defects in conductive polymer on n-type 4H- and 6H-silicon carbide substrates using Ⅰ-ⅤI and deep level transient spectroscopy techniques

机译:使用Ⅰ-ⅤI和深能级瞬态光谱技术研究n型4H和6H碳化硅衬底上导电聚合物中的深层缺陷

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摘要

The current-voltage (Ⅰ-Ⅴ) characteristics of Au/sulfonated polyaniline (SPAN)-SiC heteroj unctions have been investigated in detail over a w;de range of temperatures between 20 and 440 K. The measured I-V characteristics of all devices show a good rectification behavior at all temperatures. The room temperature rectification ratios (forward to reverse currents ratio, I_f/I_r) at 0.6 V for SPAN-type 4H-SiC and SPAN-type 6H-SiC heterojunctions are 2 x 104 and 7 x 106, respectively. The value of rectification of SPAN/6H-SiC heterojunction is four orders of magnitutude higher than the state-of-the art sulfonated polyaniline thin films deposited on n-type silicon substrates. A self-assembly technique and copolymerization were used to fabricate a self-doped polyaniline films on SiC substrates. The experimental Ⅰ-Ⅴ  data were analysed using the Werner model, which includes the series resistance of the heterojunctions. The diode parameters such as the ideality factor and the barrier height are determined from the experimental data using I-V analysis method. The effect of the temperature on these parameters is presented. Deep level transient spectroscopy (DLTS) and Laplace DLTS techniques were used to investigate the electrically active defects present in these heterostructure devices.
机译:在20至440 K的温度范围内,对金/磺化聚苯胺(SPAN)/ n-SiC异质结的电流-电压(Ⅰ-Ⅴ)特性进行了详细的研究。在所有温度下均具有良好的整流性能。 SPAN / n型4H-SiC和SPAN / n型6H-SiC异质结在0.6 V时的室温整流比(正向反向电流比I_f / I_r)分别为2 x 104和7 x 106。 SPAN / 6H-SiC异质结的整流值比沉积在n型硅基板上的最新磺化聚苯胺薄膜高4个数量级。使用自组装技术和共聚在SiC衬底上制备自掺杂聚苯胺薄膜。使用Werner模型分析了实验的Ⅰ-Ⅴ数据,其中包括了异质结的串联电阻。二极管参数(例如理想因子和势垒高度)是使用I-V分析方法根据实验数据确定的。给出了温度对这些参数的影响。深层瞬态光谱法(DLTS)和拉普拉斯DLTS技术用于研究这些异质结构器件中存在的电活性缺陷。

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  • 来源
    《Journal of Applied Physics》 |2012年第1期|p.014505.1-014505.8|共8页
  • 作者单位

    Pos-Graduacao em Ciencia de Materials, Universidade Federal de Pernambuco, Av. Professor Lull Freire sin, 50670-901 Recife, PE, Brazil,School of Physics and Astronomy, Nottingham Nanotechnology and Nanosclence Center,University of Nottingham, Nottingham NG7 2RD, United Kingdom;

    School of Physics and Astronomy, Nottingham Nanotechnology and Nanosclence Center,University of Nottingham, Nottingham NG7 2RD, United Kingdom;

    Pos-Graduacao em Ciencia de Materials, Universidade Federal de Pernambuco, Av. Professor Lull Freire sin, 50670-901 Recife, PE, Brazil;

    Group of Organic Optoelectronic Devices, Departamento de Fi'sica, Universidade Federal do Parana,Caixa Postal 19044, 81531-990 Curitiba PR, Brazil;

    Group of Organic Optoelectronic Devices, Departamento de Fi'sica, Universidade Federal do Parana,Caixa Postal 19044, 81531-990 Curitiba PR, Brazil;

    Pos-Graduacao em Ciencia de Materials, Universidade Federal de Pernambuco, Av. Professor Lull Freire sin, 50670-901 Recife, PE, Brazil,Departamento de Quimlca Fundamental, Universidade Federal de Pernambuco, Cidade Unlversltdria,50670-901 Recife, PE, Brazil;

    Pos-Graduacao em Ciencia de Materials, Universidade Federal de Pernambuco, Av. Professor Lull Freire sin, 50670-901 Recife, PE, Brazil,Departamento de Fisica, Universidade Federal de Pernambuco, Cidade Universitdria, 50670-901 Recife,PE, Brazil;

    School of Physics and Astronomy, Nottingham Nanotechnology and Nanosclence Center,University of Nottingham, Nottingham NG7 2RD, United Kingdom;

    School of Physics and Astronomy, Nottingham Nanotechnology and Nanosclence Center,University of Nottingham, Nottingham NG7 2RD, United Kingdom;

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