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首页> 外文期刊>Journal of Applied Physics >Raman scattering by the E_(2h) and A_1(LO) phonons of In_xGa_(1-x)N epilayers (0.25
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Raman scattering by the E_(2h) and A_1(LO) phonons of In_xGa_(1-x)N epilayers (0.25

机译:通过分子束外延生长的In_xGa_(1-x)N外延层(0.25

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We use Raman scattering to investigate the composition behavior of the E_(2h) and A_1(LO) phonons of In_xGa_(1-x)N and to evaluate the role of lateral compositional fluctuations and in-depth strain/ composition gradients on the frequency of the A_1(LO) bands. For this purpose, we have performed visible and ultraviolet Raman measurements on a set of high-quality epilayers grown by molecular beam epitaxy with In contents over a wide composition range (0.25 < x < 0.75). While the as-measured A_1(LO) frequency values strongly deviate from the linear dispersion predicted by the modified random-element isodisplacement (MREI) model, we show that the strain-corrected A_1(LO) frequencies are qualitatively in good agreement with the expected linear dependence. In contrast, we find that the strain-corrected E_(2h) frequencies exhibit a bowing in relation to the linear behavior predicted by the MREI model. Such bowing should be taken into account to evaluate the composition or the strain state of InGaN material from the E_(2h) peak frequencies. We show that in-depth strain/composition gradients and selective resonance excitation effects have a strong impact on the frequency of the A_1(LO) mode, making very difficult the use of this mode to evaluate the strain state or the composition of InGaN material.
机译:我们使用拉曼散射来研究In_xGa_(1-x)N的E_(2h)和A_1(LO)声子的组成行为,并评估横向组成波动和深度应变/组成梯度对频率的影响。 A_1(LO)频段。为此,我们对分子束外延生长的一组高质量外延层进行了可见光和紫外线拉曼测量,这些外延层的In含量范围很广(0.25

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  • 来源
    《Journal of Applied Physics 》 |2012年第6期| p.063502.1-063502.9| 共9页
  • 作者单位

    Institut Jaume Almera, Consell Superior d' Investigations Cientifiques (CSIC), Lluis Sole i Sabaris s.n,08028 Barcelona, Catalonia, Spain;

    Institut Jaume Almera, Consell Superior d' Investigations Cientifiques (CSIC), Lluis Sole i Sabaris s.n,08028 Barcelona, Catalonia, Spain;

    Institut Jaume Almera, Consell Superior d' Investigations Cientifiques (CSIC), Lluis Sole i Sabaris s.n,08028 Barcelona, Catalonia, Spain;

    Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27,50-370 Wroclaw,Poland;

    Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17,50-372 Wroclaw, Poland;

    Departamento de Fisica de la Materia Condensada, Cristalografia, y Mineralogia, Universidad de Valladolid, 47011 Valladolid, Spain;

    Departamento de Fisica de la Materia Condensada, Cristalografia, y Mineralogia, Universidad de Valladolid, 47011 Valladolid, Spain;

    Nottingham Nanotechnology and Nanoscience Centre, University of Nottingham, Nottingham NG7 2RD,United Kingdom;

    Department of Physics, University of Houston, 4800 Calhoun, Houston, Texas 77004, USA;

    Department of Physics, University of Houston, 4800 Calhoun, Houston, Texas 77004, USA;

    Institut Jaume Almera, Consell Superior d' Investigations Cientifiques (CSIC), Lluis Sole i Sabaris s.n,08028 Barcelona, Catalonia, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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