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首页> 外文期刊>Journal of Applied Physics >Thickness effects on the texture development of fluorine-doped SnO_2 thin films: The role of surface and strain energy
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Thickness effects on the texture development of fluorine-doped SnO_2 thin films: The role of surface and strain energy

机译:厚度对掺氟SnO_2薄膜织构发展的影响:表面和应变能的作用

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摘要

Polycrystalline fluorine-doped SnO_2 thin films have been grown by ultrasonic spray pyrolysis with a thickness varying in the range of 40 to 600 nm. A texture transition from (110) to (100) and (301) crystallographic orientations has experimentally been shown by x-ray diffraction measurements as film thickness is increased, showing that a process of abnormal grain growth has occurred. The texture effects are considered within a thermodynamic approach, in which the minimization of total free energy constitutes the driving force for grain growth. For very small film thickness, it is found that the (110) preferred orientation is due to surface energy minimization, as the (110) planes have the lowest surface energy in the rutile structure. In contrast, as film thickness is increased, the (100) and (301) crystallographic orientations are progressively predominant, owing to elastic strain energy minimization in which the anisotropic character is considered in the elastic biaxial modulus. A texture map is eventually determined, revealing the expected texture as a function of elastic strain and film thickness.
机译:已经通过超声喷雾热解法生长了掺杂多晶氟的SnO_2薄膜,其厚度在40至600nm的范围内变化。 X射线衍射测量表明,随着膜厚的增加,从(110)晶向(100)和(301)晶向的织构转变已得到实验证明,表明发生了异常晶粒长大的过程。在热力学方法中考虑了纹理效应,其中总自由能的最小化构成了晶粒生长的驱动力。对于非常小的膜厚度,发现(110)的优选取向是由于表面能最小化,因为(110)平面在金红石结构中具有最低的表面能。相反,随着膜厚度的增加,由于弹性应变能最小化(其中在弹性双轴模量中考虑了各向异性特性),(100)和(301)晶体学取向逐渐占主导地位。最终确定纹理图,揭示了预期的纹理与弹性应变和膜厚度的关系。

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  • 来源
    《Journal of Applied Physics》 |2012年第3期|p.033523.1-033523.7|共7页
  • 作者单位

    Laboratoire des Materiaux et du Genie Physique, CNRS - Grenoble 1NP, 3 parvis Louis Neel,38016 Grenoble, France;

    Laboratoire des Materiaux et du Genie Physique, CNRS - Grenoble 1NP, 3 parvis Louis Neel,38016 Grenoble, France;

    Laboratoire des Materiaux et du Genie Physique, CNRS - Grenoble 1NP, 3 parvis Louis Neel,38016 Grenoble, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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