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Dielectric properties of Ge_2Sb_2Te_5 phase-change films

机译:Ge_2Sb_2Te_5相变膜的介电性能

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摘要

The static (ε_s) and high-frequency (ε_∞) dielectric constants of amorphous and NaCl-type crystalline Ge_2Sb_2Te_5 were measured and the relaxation effects in films were studied using impedance spectroscopy. On the basis of a simple method that allows obtaining the dielectric constant in the low resistivity planar structure, static and high frequency dielectric constants and their temperature dependencies were calculated in both phases. A surprising value of ε_s ≈ 750 in crystalline films was obtained, but the effective dielectric constant, ε_(eff), estimated from the Maxwell-Wagner effective medium model, is significantly lower (e_(eff) ≈ 34.9). Such a high value of ε_s obtained by electrical impedance measurements has been explained by Maxwell-Wagner relaxation, the separation of charges at the interface between grains and grain boundaries. Additionally, three relaxation processes (alpha, beta, and Ohmic relaxation) were observed in the amorphous phase and four relaxations (dipolar relaxation of grains, Ohmic relaxation of grains, dipolar relaxation of grain boundaries, and Maxwell-Wagner relaxation) were observed in the crystalline phase. From these results, a new rule for the selection of materials for optical phase-change data storage is proposed: polycrystalline films must have a high volume fraction of grain boundaries. This requirement increases the effective dielectric constant and the reflectance contrast between amorphous and crystalline phases.
机译:测量了非晶态和NaCl型晶体Ge_2Sb_2Te_5的静态(ε_s)和高频介电常数(ε_∞),并使用阻抗谱研究了薄膜的弛豫效应。基于一种允许在低电阻率平面结构中获得介电常数的简单方法,计算了两个阶段的静态和高频介电常数及其温度依赖性。在晶体膜中获得了令人惊讶的ε_s≈750,但是根据麦克斯韦-瓦格纳有效介质模型估算的有效介电常数ε_(eff)明显较低(e_(eff)≈34.9)。通过电阻抗测量获得的如此高的ε_s值已通过麦克斯韦-瓦格纳弛豫,晶粒与晶界之间的界面处的电荷分离进行了解释。此外,在非晶态中观察到三个弛豫过程(α,β和欧姆弛豫),在晶体中观察到四个弛豫(晶粒的偶极弛豫,晶粒的欧姆弛豫,晶界的偶极弛豫和麦克斯韦-瓦格纳弛豫)。结晶相。根据这些结果,提出了一种选择用于光学相变数据存储的材料的新规则:多晶膜必须具有高体积分数的晶界。该要求增加了有效介电常数和非晶相与结晶相之间的反射率对比。

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  • 来源
    《Journal of Applied Physics 》 |2013年第11期| 113705.1-113705.8| 共8页
  • 作者单位

    CINVESTAV Unidad Queretaro, Libramiento Norponiente No. 2000, Juriquilla 76230, Queretaro, Mexico;

    CINVESTAV Unidad Queretaro, Libramiento Norponiente No. 2000, Juriquilla 76230, Queretaro, Mexico;

    CINVESTAV Unidad Queretaro, Libramiento Norponiente No. 2000, Juriquilla 76230, Queretaro, Mexico;

    CINVESTAV Unidad Queretaro, Libramiento Norponiente No. 2000, Juriquilla 76230, Queretaro, Mexico;

    CINVESTAV Unidad Queretaro, Libramiento Norponiente No. 2000, Juriquilla 76230, Queretaro, Mexico;

    CINVESTAV Unidad Queretaro, Libramiento Norponiente No. 2000, Juriquilla 76230, Queretaro, Mexico;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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