机译:界面黏附和杂质质量对原子结处声子传输的影响
Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville,Virginia 22904, USA,Engineering Sciences Center, Sandia National Laboratories, P.O. Box 5800, Albuquerque,New Mexico 87185, USA;
Department of Electrical and Computer Engineering, University of Virginia, Charlottesville,Virginia 22904, USA;
Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville,Virginia 22904, USA;
Department of Electrical and Computer Engineering, University of Virginia, Charlottesville,Virginia 22904, USA;
Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville,Virginia 22904, USA;
Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville,Virginia 22904, USA;
机译:原子杂质对界面粘合强度影响的热力学模型
机译:非平衡声子对通过原子和分子桥结的传输性质的影响
机译:一维原子结中电子和声子的耦合传输
机译:拉曼研究吸气部位金属杂质对4H-SiC n-n〜+结的声子和电子相关性能的影响
机译:第一性原理研究声子在二维材料中的传输以及声子在硅化镁/锡化镁界面上的传输。
机译:相干声子能谱分析卷起的GaAs / In0.2Ga0.8As多层管的界面黏附和结构表征
机译:原子线和单分子结中的电子传输和声子