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首页> 外文期刊>Journal of Applied Physics >Field-induced domain wall motion of amorphous [CoSiB/Pt]_N multilayers with perpendicular anisotropy
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Field-induced domain wall motion of amorphous [CoSiB/Pt]_N multilayers with perpendicular anisotropy

机译:具有垂直各向异性的非晶态[CoSiB / Pt] _N多层膜的场致畴壁运动

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摘要

Amorphous CoSiB/Pt multilayer is a perpendicular magnetic anisotropy material to achieve high squareness, low coercivity, strong anisotropy, and smooth domain wall (DW) motion, because of the smoother interface compared with crystalline multilayers. For [CoSiB(6A)/Pt (14A)]_N multilayers with N = 3, 6, and 9, we studied the field-induced DW dynamics. The effective anisotropy constant K_1~(eff) is 1.5 × 10~6 erg/cm~3 for all the N values, and the linear increment of coercive field H_c with N gives constant exchange coupling J. By analyzing the field dependence of DW images at room temperature, a clear creep motion with the exponent μ=1/4 could be observed. Even though the pinning field H_(dep) slightly increases with N, the pinning potential energy U_c is constant (=35 k_BT) for all the N values. These results imply that the amorphous [CoSiB/Pt]_N multilayers are inherently homogeneous compared to crystalline multilayers. For N ≤ 6, the pinning site density ρ_(pin) is less than 1000/μm~2, which is about 1 pinning site per the typical device junction size of 30 × 30 nm~2. Also, the exchange stiffness constant A_(ex) is obtained to be 0.48 × 10~(-6)erg/cm, and the domain wall width is expected to be smaller than 5.5 nm. These results may be applicable for spin-transfer-torque magnetic random access memory and DW logic device applications.
机译:非晶CoSiB / Pt多层膜是一种垂直磁各向异性材料,因为与晶体多层膜相比,界面更光滑,因此可以实现高矩形度,低矫顽力,强各向异性和平滑的畴壁(DW)运动。对于N = 3、6和9的[CoSiB(6A)/ Pt(14A)] _ N多层膜,我们研究了场致DW动力学。对于所有N值,有效各向异性常数K_1〜(eff)为1.5×10〜6 erg / cm〜3,矫顽场H_c与N的线性增量给出恒定的交换耦合J。通过分析DW图像的场相关性在室温下,可以观察到清晰的蠕变运动,指数μ= 1/4。即使钉扎场H_(dep)随N稍微增加,钉扎势能U_c对于所有N个值都是恒定的(= 35 k_BT)。这些结果表明,与晶体多层相比,非晶[CoSiB / Pt] _N多层固有地是均匀的。对于N≤6,钉扎位点密度ρ_(pin)小于1000 /μm〜2,对于典型的器件结尺寸30×30 nm〜2,大约为1钉扎位点。另外,获得的交换刚度常数A_(ex)为0.48×10〜(-6)erg / cm,并且预期畴壁宽度小于5.5nm。这些结果可能适用于自旋转移转矩磁性随机存取存储器和DW逻辑器件应用。

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  • 来源
    《Journal of Applied Physics 》 |2014年第18期| 183901.1-183901.6| 共6页
  • 作者单位

    Department of Physics, Sogang University, Seoul 121-742, South Korea;

    Department of Physics, Sogang University, Seoul 121-742, South Korea;

    Department of Physics, Inha University, Incheon 402-751, South Korea;

    Department of Physics, Inha University, Incheon 402-751, South Korea;

    Department of Physics, Inha University, Incheon 402-751, South Korea;

    Department of Advanced Materials Engineering, Sejong University, Seoul 143-747, South Korea;

    Department of Physics, Sogang University, Seoul 121-742, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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