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机译:外延L1_0-Mn_(1.4)Ga薄膜的退火温度和磁性能的厚度依赖性
Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576;
Data Storage Institute, 5 Engineering Drive 1, Singapore 117608;
Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576;
Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576;
机译:外延L10-Mn1.4Ga薄膜的退火温度和磁性能的厚度依赖性
机译:L1_0-Mn_(50)Ga_(50-x)Al_x外延生长薄膜的磁性
机译:NiO外延膜中磁矩的温度和厚度依赖性
机译:厚度依赖性的厚度依赖性的退火Fe / Pt _N多层膜的磁性
机译:改进IV族光子图:研究外延生长,低温硅和掺杂硅薄膜的材料特性
机译:原子层沉积生长La2O3薄膜的膜厚和退火温度表征结构性能。
机译:错误:CO2薄膜结构和磁性性能的退火温度和厚度依赖性物理。 Rev. B 94,104424(2016)