...
首页> 外文期刊>Journal of Applied Physics >Study of gain and photoresponse characteristics for back-illuminated separate absorption and multiplication GaN avalanche photodiodes
【24h】

Study of gain and photoresponse characteristics for back-illuminated separate absorption and multiplication GaN avalanche photodiodes

机译:背照式分离吸收和倍增GaN雪崩光电二极管的增益和光响应特性的研究

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

The gain and photoresponse characteristics have been numerically studied for back-illuminated separate absorption and multiplication (SAM) GaN avalanche photodiodes (APDs). The parameters of fundamental models are calibrated by simultaneously comparing the simulated dark and light current characteristics with the experimental results. Effects of environmental temperatures and device dimensions on gain characteristics have been investigated, and a method to achieve the optimum thickness of charge layer is obtained. The dependence of gain characteristics and breakdown voltage on the doping concentration of the charge layer is also studied in detail to get the optimal charge layer. The bias-dependent spectral responsivity and quantum efficiency are then presented to study the photoresponse mechanisms inside SAM GaN APDs. It is found the responsivity peak red-shifts at first due to the Franz-Keldysh effect and then blue-shifts due to the reach-through effect of the absorption layer. Finally, a new SAM GaN/AlGaN heterojunction APD structure is proposed for optimizing SAM GaN APDs.
机译:已经对背照式分离吸收和倍增(SAM)GaN雪崩光电二极管(APD)进行了增益和光响应特性的数值研究。通过同时将模拟的暗和亮电流特性与实验结果进行比较,可以校准基本模型的参数。已经研究了环境温度和器件尺寸对增益特性的影响,并获得了实现最佳电荷层厚度的方法。还详细研究了增益特性和击穿电压对电荷层掺杂浓度的依赖性,以获得最佳电荷层。然后提出了与偏压有关的光谱响应度和量子效率,以研究SAM GaN APD内部的光响应机理。发现响应度峰首先由于弗朗兹-凯尔迪什效应而红移,然后由于吸收层的直通效应而蓝移。最后,提出了一种新的SAM GaN / AlGaN异质结APD结构,以优化SAM GaN APD。

著录项

  • 来源
    《Journal of Applied Physics》 |2014年第1期|013103.1-013103.8|共8页
  • 作者单位

    No. 50 Research Institute of China Electronics Technology Group Corporation, 200331 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 200331 Shanghai, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 200331 Shanghai, China;

    No. 50 Research Institute of China Electronics Technology Group Corporation, 200331 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号