首页> 外国专利> SEPARATE ABSORPTION CHARGE AND MULTIPLICATION AVALANCHE PHOTODIODE STRUCTURE AND METHOD OF MAKING SUCH A STRUCTURE

SEPARATE ABSORPTION CHARGE AND MULTIPLICATION AVALANCHE PHOTODIODE STRUCTURE AND METHOD OF MAKING SUCH A STRUCTURE

机译:单独的吸收电荷和乘法雪崩光电二极管结构及制造这种结构的方法

摘要

One illustrative photodiode disclosed herein includes an N-doped anode region, a P-doped cathode region and at least one P-doped charge region positioned laterally between the N-doped anode region and the P-doped cathode region. In this example, the photodiode also includes a plurality of quantum dots embedded within the at least one P-doped charge region and an N-doped impact ionization region positioned laterally between the N-doped anode region and the at least one P-doped charge region.
机译:本文公开的一个说明性光电二极管包括n掺杂的阳极区,p掺杂的阴极区和至少一个位于n掺杂的阳极区和p掺杂的阴极区域之间的至少一个p掺杂的电荷区域。在该示例中,光电二极管还包括嵌入在至少一个p掺杂的电荷区域内的多个量子点,以及在N掺杂的阳极区和至少一个P掺杂电荷之间横向定位的n掺杂的冲击电离区域地区。

著录项

  • 公开/公告号US2021202778A1

    专利类型

  • 公开/公告日2021-07-01

    原文格式PDF

  • 申请/专利权人 GLOBALFOUNDRIES U.S. INC.;

    申请/专利号US201916727321

  • 发明设计人 AJEY POOVANNUMMOOTTIL JACOB;YUSHENG BIAN;

    申请日2019-12-26

  • 分类号H01L31/107;H01L31/028;H01L31/18;

  • 国家 US

  • 入库时间 2022-08-24 19:41:51

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