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Modeling the spectral shape of InGaAIP-based red light-emitting diodes

机译:基于InGaAIP的红色发光二极管的光谱形状建模

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摘要

We have developed a spectral model for describing the shape of the emission spectrum of InGaAIP-based red light-emitting diodes (LEDs) with quantum-well structure. The model is based on Maxwell-Boltzmann distribution with junction temperature T_j and an experimental two-dimensional joint density of states (DOS). We model the DOS with a sum of two exponentially broadened step functions describing the two lowest sub-bands in semiconductor quantum well. The relative locations ΔΕ_1 =0meV and ΔΕ_2 = 112.7meV above the band gap energy E_g= 1.983 eV and the ratio 2.13 of the step heights were fixed using an experimental DOS extracted from a LED spectrum measured at known T_j and driving current I. The model can then be fitted to other spectra of other LED samples at varied T_j and / by varying the fitting parameters E_g, T_j, and the broadening of the sub-band edges. The model was tested for three LED samples over I = 200-370 mA and T_j = 303-398 K. Junction temperatures obtained by modeling were compared with calibrated T_j obtained by the forward voltage method. The mean absolute difference was about 2.9 K (0.8%) over the whole region studied and the maximum difference was 8.5 K. The thermal coefficient measured for E_g was -0.509 meVK~(-1). For the first and second sub-band edges, the thermal broadening coefficients were 18 μeVK~(-1) and 37 μeVK~(-1) respectively.
机译:我们已经开发了一种光谱模型,用于描述具有量子阱结构的基于InGaAIP的红色发光二极管(LED)的发射光谱的形状。该模型基于具有结温T_j的Maxwell-Boltzmann分布和实验的二维联合状态密度(DOS)。我们用两个指数加宽的阶跃函数之和来建模DOS,以描述半导体量子阱中的两个最低子带。使用从已知T_j测得的LED光谱和驱动电流I提取的实验DOS来固定带隙能量E_g = 1.983 eV上方的相对位置ΔΕ_1= 0meV和ΔΕ_2= 112.7meV,阶跃比2.13固定。然后可以通过改变拟合参数E_g,T_j以及子带边缘的加宽,在变化的T_j和/下拟合其他LED样本的其他光谱。针对I = 200-370 mA和T_j = 303-398 K的三个LED样品测试了该模型。将通过建模获得的结温与通过正向电压方法获得的校准T_j进行了比较。在整个研究区域中,平均绝对差约为2.9 K(0.8%),最大差为8.5K。E_g的热系数为-0.509 meVK〜(-1)。对于第一和第二子带边缘,热展宽系数分别为18μeVK〜(-1)和37μeVK〜(-1)。

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  • 来源
    《Journal of Applied Physics》 |2015年第20期|203103.1-203103.7|共7页
  • 作者单位

    Metrology Research Institute, Aalto University, P.O. Box 13000, 00076 Aalto, Finland;

    Metrology Research Institute, Aalto University, P.O. Box 13000, 00076 Aalto, Finland,MIKES Metrology, VTT Technical Research Centre of Finland Ltd., P.O. Box 1000, 02044 VTT, Finland;

    Metrology Research Institute, Aalto University, P.O. Box 13000, 00076 Aalto, Finland;

    Hungarian Trade Licensing Office, P.O. Box 919,1534 Budapest, Hungary;

    Metrology Research Institute, Aalto University, P.O. Box 13000, 00076 Aalto, Finland,MIKES Metrology, VTT Technical Research Centre of Finland Ltd., P.O. Box 1000, 02044 VTT, Finland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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