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首页> 外文期刊>Journal of Applied Physics >Quaternary AlInGaN/InGaN quantum well on vicinal c-plane substrate for high emission intensity of green wavelengths
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Quaternary AlInGaN/InGaN quantum well on vicinal c-plane substrate for high emission intensity of green wavelengths

机译:在邻近c平面衬底上的四元AlInGaN / InGaN量子阱,用于绿色波长的高发射强度

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摘要

Electronic and optical properties of non-trivial semipolar AlInGaN/InGaN quantum well (QW) structures are investigated by using the multiband effective-mass theory and non-Markovian optical model. On vicinal c-plane GaN substrate miscut by a small angle (θ<40°) from c-plane, the AlInGaN/InGaN system is shown to have ~3 times larger spontaneous emission peak intensity than the conventional InGaN/GaN system at green wavelength. It is attributed to much larger optical matrix element of the quaternary AlInGaN/InGaN system, derived from the reduction of internal electric field induced by polarizations. This effect exceeds the performance-degrading factor of smaller quasi-Fermi-level separation for the quaternary AlInGaN/InGaN system than that for the conventional InGaN/GaN system. Results indicate that the use of quaternary Ⅲ-nitride QWs on vicinal substrates may be beneficial in improving the performance of optical devices emitting green light.
机译:利用多带有效质量理论和非马尔可夫光学模型研究了非平凡的半极性AlInGaN / InGaN量子阱(QW)结构的电子和光学性质。在与c平面成小角度(θ<40°)倾斜的邻近c平面GaN衬底上,AlInGaN / InGaN系统的自发发射峰强度显示为绿色波长处传统InGaN / GaN系统的约3倍。 。这归因于四级AlInGaN / InGaN系统的更大的光学矩阵元素,这是由于极化引起的内部电场减少而产生的。与传统的InGaN / GaN系统相比,该效果超出了四元AlInGaN / InGaN系统的准费米能级分离的性能下降因素。结果表明,在邻域基板上使用季Ⅲ氮化物QW可能有益于改善发出绿光的光学器件的性能。

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  • 来源
    《Journal of Applied Physics 》 |2015年第18期| 185707.1-185707.6| 共6页
  • 作者单位

    Department of Electronics Engineering, Catholic University of Daegu, Hayang, Kyeongbuk 712-702, South Korea;

    Advanced Institutes of Convergence Technology, Seoul National University, Suwon, South Korea;

    Advanced Institutes of Convergence Technology, Seoul National University, Suwon, South Korea;

    Department of Mechanical Engineering, Ajou University, Suwon, South Korea;

    Department of Mechanical Engineering, Ajou University, Suwon, South Korea;

    CAE Group, Platform Technology Lab, Samsung Advanced Institute of Technology, Samsung Street 130, Suwon, Kyeonggi-Do 443-803, South Korea;

    CAE Group, Platform Technology Lab, Samsung Advanced Institute of Technology, Samsung Street 130, Suwon, Kyeonggi-Do 443-803, South Korea;

    CAE Group, Platform Technology Lab, Samsung Advanced Institute of Technology, Samsung Street 130, Suwon, Kyeonggi-Do 443-803, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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